Fluorine (F)
halogenGas
प्रमाणित अणुभार
18.998403 uइलेक्ट्रॉन संरूपण
[He] 2s2 2p5द्रवणांक
-219.62 °Cउत्कलनांक
-188.12 °Cघनता
1.696 kg/m³ऑक्सिडीकरण अवस्था
-1विद्युतऋणता (पॉलिंग)
3.98आयनीकरण ऊर्जा (पहिली)
17.42282 eVशोधाचे वर्ष
1886अणुत्रिज्या
50 pmतपशील
Fluorine is the lightest halogen and the most electronegative chemical element. In elemental form it occurs as diatomic fluorine, F₂, a highly reactive oxidizing gas. Natural fluorine is almost entirely the stable isotope ¹⁹F and is found in minerals rather than as the free element. Its chemistry underlies fluoride minerals, uranium enrichment chemistry, fluoropolymers, refrigerants, many agrochemicals, and a large share of modern medicinal chemistry.
Fluorine is the most electronegative and reactive of all elements. It is a pale yellow, corrosive gas, which reacts with most organic and inorganic substances. Finely divided metals, glass, ceramics, carbon, and even water burn in fluorine with a bright flame.
Until World War II, there was no commercial production of elemental fluorine. The nuclear bomb project and nuclear energy applications, however, made it necessary to produce large quantities.
The name derives from the Latin fluere for "flow" or "flux" because fluorite (CaF2) was used as a flux in metallurgy owing to its low melting point. It was discovered in hydrofluoric acid by the Swedish pharmacist and chemist Carl-Wilhelm Scheele in 1771, but it was not isolated until 1886 by the French pharmacist and chemist Henri Moissan.
Fluorine is the most reactive of all elements and no chemical substance is capable of freeing fluorine from any of its compounds. For this reason, fluorine does not occur free in nature and was extremely difficult for scientists to isolate. The first recorded use of a fluorine compound dates to around 1670 to a set of instructions for etching glass that called for Bohemian emerald (CaF2). Chemists attempted to identify the material that was capable of etching glass and George Gore was able to produce a small amount of fluorine through an electrolytic process in 1869. Unknown to Gore, fluorine gas explosively combines with hydrogen gas. That is exactly what happened in Gore's experiment when the fluorine gas that formed on one electrode combined with the hydrogen gas that formed on the other electrode. Ferdinand Frederic Henri Moissan, a French chemist, was the first to successfully isolate fluorine in 1886. He did this through the electrolysis of potassium fluoride (KF) and hydrofluoric acid (HF). He also completely isolated the fluorine gas from the hydrogen gas and he built his electrolysis device completely from platinum. His work was so impressive that he was awarded the Nobel Prize for chemistry in 1906. Today, fluorine is still produced through the electrolysis of potassium fluoride and hydrofluoric acid as well as through the electrolysis of molten potassium acid fluoride (KHF2).
From the Latin and French fluere: flow or flux. In 1529, Georigius Agricola described the use of fluorspar as a flux, and as early as 1670 Schwandhard found that glass was etched when exposed to fluorspar treated with acid. Scheele and many later investigators, including Davy, Gay-Lussac, Lavoisier, and Thenard, experimented with hydrofluoric acid, some experiments ending tragically.
The element was finally isolated in 1866 by Moissan after nearly 74 years of continuous effort.
Pure fluorine, F₂, is a pale yellow gas at ordinary temperature and pressure. It condenses to a yellow liquid and freezes to a pale solid at low temperature. The gas has a sharp, irritating odor, but odor is not a safe means of detection.
Elemental fluorine, F₂, is used mainly where its extreme oxidizing and fluorinating power is required, including preparation of uranium hexafluoride, UF₆, for isotope separation and manufacture of some specialty inorganic fluorides. Much larger practical importance lies in fluorine-containing compounds. Fluoropolymers such as polytetrafluoroethylene, (C₂F₄)ₙ, are used for chemically resistant coatings, seals, membranes, and electrical insulation. Fluoride compounds are used in glass etching, aluminum production, dental products, pharmaceuticals, and crop-protection chemicals.
Fluorine is added to city water supplies in the proportion of about one part per million to help prevent tooth decay. Sodium fluoride (NaF), stannous(II) fluoride (SnF2) and sodium monofluorophosphate (Na2PO3F) are all fluorine compounds added to toothpaste, also to help prevent tooth decay. Hydrofluoric acid (HF) is used to etch glass, including most of the glass used in light bulbs. Uranium hexafluoride (UF6) is used to separate isotopes of uranium. Crystals of calcium fluoride (CaF2), also known as fluorite and fluorspar, are used to make lenses to focus infrared light. Fluorine joins with carbon to form a class of compounds known as fluorocarbons. Some of these compounds, such as dichlorodifluoromethane (CF2Cl2), were widely used in air conditioning and refrigeration systems and in aerosol spray cans, but have been phased out due to the damage they were causing to the earth's ozone layer.
Fluorine and its compounds are used in producing uranium (from the hexafluoride) and more than 100 commercial fluorochemicals, including many high-temperature plastics. Hydrofluoric acid etches glass of light bulbs. Fluorochlorohydrocarbons are extensively used in air conditioning and refrigeration.
The presence of fluorine as a soluble fluoride in drinking water to the extent of 2 ppm may cause mottled enamel in teeth when used by children acquiring permanent teeth; in smaller amounts, however, fluoride helps prevent dental cavities.
Elemental fluorine has been studied as a rocket propellant as it has an exceptionally high specific impulse value.
Isotopes in Medicine
18F is a radioactive fluorine isotope that is used in an 18F-FDG compound (18F-labeled, fluoro-deoxy glucose) for imaging the organs, bones, tissues, and brain of the body with a technique called positron emission topography (PET). The 18F-FDG compound is injected and the isotopically labeled glucose is consumed by any cell requiring glucose as a source of energy [98] R. Krebs. The History And Use Of Our Earth’s Chemical Elements: A Reference Guide, 2nd ed. Greenwood Press, Westport, CT (2006)., [99] World Nuclear Association. Radioisotopes in Medicine, World Nuclear Association (2014), Feb. 23; http://www.world-nuclear.org/info/inf55.html..
– 18F emits positrons that collect in tissue and interact with regular negative electrons when injected into the body. The positrons and electrons annihilate each other, producing two gamma rays that are emitted in opposite directions. The radiation is detected on a PET camera, which generates a picture of the body part being examined (Fig. IUPAC.9.1).
–Because 18F has a short half-life of about 110 min, there is little chance of radiation damage to the patient.
Fluorine most commonly has oxidation state −1 in compounds, as in hydrogen fluoride, HF, sodium fluoride, NaF, and calcium fluoride, CaF₂. With highly electropositive elements it forms ionic fluorides; with nonmetals it forms strongly covalent fluorides such as sulfur hexafluoride, SF₆, and silicon tetrafluoride, SiF₄. Fluorine can also form interhalogen compounds, including chlorine trifluoride, ClF₃. Oxygen fluorides such as oxygen difluoride, OF₂, are unusual because fluorine is assigned the negative oxidation state while oxygen is positive.
One hypothesis says that fluorine can be substituted for hydrogen wherever it occurs in organic compounds, which could lead to an astronomical number of new fluorine compounds. Compounds of fluorine with rare gases have now been confirmed in fluorides of xenon, radon, and krypton.
See more information at the Fluorine compound page.
Elemental fluorine, F₂, is acutely toxic, corrosive, and a powerful oxidizer that can ignite or violently react with many materials. Hydrogen fluoride, HF, is especially hazardous because it penetrates tissue and binds calcium and magnesium ions. Soluble fluorides can be toxic at sufficient dose, while controlled low concentrations of fluoride ion, F⁻, have dental uses. Some fluorinated gases are chemically stable but may be asphyxiants or potent greenhouse gases.
Elemental fluorine and the fluoride ion are highly toxic. The free element has a characteristic pungent odor, detectable in concentrations as low as 20 ppb, which is below the safe working level. The recommended maximum allowable concentration for a daily 8-hour time-weighted exposure is 1 ppm.
Fluorine enters the environment chiefly as fluoride in minerals, volcanic emissions, sea spray, industrial releases, and weathering products. Fluoride ion, F⁻, binds to calcium, aluminum, and iron phases and can be immobilized in soils or sediments, though mobility depends strongly on pH and water chemistry. Elevated natural or industrial fluoride in groundwater can affect teeth, bones, livestock, and vegetation. Persistent organofluorine compounds vary widely in mobility and degradation behavior.
Fluorine supply is based primarily on mining fluorite, CaF₂, with smaller contributions from fluorapatite-bearing phosphate rock processed in fertilizer production. Hydrogen fluoride, HF, is the central industrial intermediate, made by treating fluorite with sulfuric acid, H₂SO₄. Direct production and transport of elemental fluorine are limited by its reactivity, so it is commonly generated or consumed close to the point of use. Demand is tied to aluminum smelting, chemical manufacturing, electronics materials, fluoropolymers, and regulated refrigerant transitions. Recycling is important for some fluorinated materials but is often chemically or economically difficult.
Found in the minerals fluorite (CaF2) and cryolite(Na3AlF6). Electrolysis of hydrofluoric acid (HF) or potassium acid fluoride (KHF2) is the only practical method of commercial production.
Fluorine is relatively rare in the cosmos compared with neighboring light elements. It is thought to be made in several settings, including helium-burning regions of evolved stars, neutrino-driven processes in core-collapse supernovae, and possibly novae, with their relative contributions still studied. In planetary materials it is concentrated into minerals, melts, and volatile-bearing phases rather than remaining as free F₂.
- Fluorine has only one stable natural isotope, ¹⁹F.
- Fluorite, CaF₂, gave the element its name through its use as a flux.
- Glass etching by hydrogen fluoride, HF, reflects the strength of silicon-fluorine bonding.
- Polytetrafluoroethylene, (C₂F₄)ₙ, was discovered accidentally during refrigerant research.
- Uranium hexafluoride, UF₆, is volatile enough for gas-phase isotope enrichment.
- Fluoride minerals can preserve fluorine in rocks over geologic time.
प्रतिमा
गुणधर्म
भौतिक
- अणुत्रिज्या (अनुभवाधारित)
- 50 pm सर्व घटकांच्या अणुत्रिज्या (अनुभवाधारित) ची तुलना करा →
- सहसंयुजी त्रिज्या
- 57 pm सर्व घटकांच्या सहसंयुजी त्रिज्या ची तुलना करा →
- व्हॅन डर वाल्स त्रिज्या
- 135 pm सर्व घटकांच्या व्हॅन डर वाल्स त्रिज्या ची तुलना करा →
- घनता
- 1.696 kg/m³ सर्व घटकांच्या घनता ची तुलना करा →
- मोलर आयतन
- 0.0171 L/mol
- STP येथे अवस्था
- वायू सर्व घटकांच्या STP येथे अवस्था ची तुलना करा →
- द्रवणांक
- -219.62 °C सर्व घटकांच्या द्रवणांक ची तुलना करा →
- उत्कलनांक
- -188.12 °C सर्व घटकांच्या उत्कलनांक ची तुलना करा →
- उष्णता चालकता
- 0.028 W/(m·K) सर्व घटकांच्या उष्णता चालकता ची तुलना करा →
- विशिष्ट उष्माधारकता
- 0.824 J/(g·K) सर्व घटकांच्या विशिष्ट उष्माधारकता ची तुलना करा →
- मोलर उष्माधारकता
- 31.304 J/(mol·K) सर्व घटकांच्या मोलर उष्माधारकता ची तुलना करा →
- स्फटिक संरचना
- एकनताक्ष सर्व घटकांच्या स्फटिक संरचना ची तुलना करा →
रासायनिक
- विद्युतऋणता (पॉलिंग)
- 3.98 सर्व घटकांच्या विद्युतऋणता (पॉलिंग) ची तुलना करा →
- विद्युतऋणता (ॲलन)
- 4.193
- इलेक्ट्रॉन आसक्ती
- 3.4011 eV
- आयनीकरण ऊर्जा (पहिली)
- 17.42282 eV सर्व घटकांच्या आयनीकरण ऊर्जा (पहिली) ची तुलना करा →
- आयनीकरण ऊर्जा (दुसरी)
- 34.97093 eV सर्व घटकांच्या आयनीकरण ऊर्जा (दुसरी) ची तुलना करा →
- आयनीकरण ऊर्जा (तिसरी)
- 62.708196 eV सर्व घटकांच्या आयनीकरण ऊर्जा (तिसरी) ची तुलना करा →
- आयनीकरण ऊर्जा (चौथी)
- 87.1753 eV सर्व घटकांच्या आयनीकरण ऊर्जा (चौथी) ची तुलना करा →
- आयनीकरण ऊर्जा (पाचवी)
- 114.249393 eV सर्व घटकांच्या आयनीकरण ऊर्जा (पाचवी) ची तुलना करा →
- ऑक्सिडीकरण अवस्था
- -1 सर्व घटकांच्या ऑक्सिडीकरण अवस्था ची तुलना करा →
- संयुजा इलेक्ट्रॉन
- 7 सर्व घटकांच्या संयुजा इलेक्ट्रॉन ची तुलना करा →
- इलेक्ट्रॉन संरूपण
- [He] 2s2 2p5
उष्मागतिक
- त्रिक बिंदू (तापमान)
- -219.67 °C
- त्रिक बिंदू (दाब)
- 9e+4 Pa
- क्रांतिक बिंदू (तापमान)
- -128.74 °C
- क्रांतिक बिंदू (दाब)
- 5.1724e+6 Pa
- द्रवण उष्मा
- 0.0026429 eV सर्व घटकांच्या द्रवण उष्मा ची तुलना करा →
- बाष्पीभवन उष्मा
- 0.06778256 eV सर्व घटकांच्या बाष्पीभवन उष्मा ची तुलना करा →
- अणूकरण उष्मा
- 0.8228222 eV
- अणूकरण एन्थाल्पी
- 0.82225216 eV
केंद्रकीय
- प्रोटॉन
- 9 सर्व घटकांच्या प्रोटॉन ची तुलना करा →
- न्यूट्रॉन
- 10 सर्व घटकांच्या न्यूट्रॉन ची तुलना करा →
- ज्ञात समस्थानिके
- 19 सर्व घटकांच्या ज्ञात समस्थानिके ची तुलना करा →
- स्थिर समस्थानिके
- 1 सर्व घटकांच्या स्थिर समस्थानिके ची तुलना करा →
- सर्वाधिक स्थिर समस्थानिक
- F-19
- शोधाचे वर्ष
- 1886
विपुलता
- विपुलता (पृथ्वीचे कवच)
- 585 mg/kg सर्व घटकांच्या विपुलता (पृथ्वीचे कवच) ची तुलना करा →
- विपुलता (महासागर)
- 1.3 mg/L सर्व घटकांच्या विपुलता (महासागर) ची तुलना करा →
स्फटिक संरचना
उपलब्ध नाही
इलेक्ट्रॉन संरचना
- प्रत्येक कवचातील इलेक्ट्रॉन
- 2, 7 सर्व घटकांच्या प्रत्येक कवचातील इलेक्ट्रॉन ची तुलना करा →
ओळखचिन्हे
- CAS क्रमांक
- 7782-41-4 सर्व घटकांच्या CAS क्रमांक ची तुलना करा →
- टर्म चिन्ह
- 2P°3/2
- InChI
- InChI=1S/F
- InChI की
- YCKRFDGAMUMZLT-UHFFFAOYSA-N
इलेक्ट्रॉन संरूपण मोजलेले
F: 2s² 2p⁵[He] 2s² 2p⁵1s² 2s² 2p⁵अणुप्रतिमान
समस्थानिकांमुळे न्यूट्रॉन संख्या, वस्तुमान आणि स्थैर्य बदलते — विद्युतदृष्ट्या उदासीन अणूचे इलेक्ट्रॉन संरूपण बदलत नाही.
योजनात्मक अणुप्रतिमान, प्रमाणानुसार नाही.
अणूची विशिष्ट ओळख
उत्सर्जन / शोषण वर्णपट
समस्थानिक वितरण
| वस्तुमानांक | अणुवस्तुमान (u) | नैसर्गिक विपुलता | अर्धायुष्य |
|---|---|---|---|
| 19 स्थिर | १८.९९८४०३१६२७३ ± ०.०००००००००९२ | 100.0000% | स्थिर |
अवस्था / स्थिती
कारण: उत्कलनांकापेक्षा (-188.12 °C) 213.1 °C अधिक
योजनात्मक, प्रमाणानुसार नाही
अवस्थांतर बिंदू
अवस्थांतर ऊर्जा
द्रवणांकावर 1 mol वितळवण्यासाठी आवश्यक ऊर्जा
उत्कलनांकावर 1 mol चे बाष्पीभवन करण्यासाठी आवश्यक ऊर्जा
घनता
प्रमाणित परिस्थितीत
सध्याच्या T येथे आदर्श वायू नियमाने अंदाजित
प्रगत
अणुवर्णपट
वर्णरेषांचा संग्रह ?
| आयन | विद्युतभार | एकूण वर्णरेषा | संक्रमण संभाव्यता | पातळ्यांची नामांकने |
|---|---|---|---|---|
| F I | 0 | 162 | 120 | 162 |
| F II | +1 | 150 | 67 | 67 |
| F III | +2 | 141 | 34 | 34 |
| F IV | +3 | 75 | 30 | 30 |
| F V | +4 | 513 | 472 | 472 |
| F VI | +5 | 269 | 269 | 269 |
| F VII | +6 | 470 | 439 | 470 |
| F VIII | +7 | 128 | 128 | 128 |
| F IX | +8 | 137 | 137 | 137 |
ऊर्जा पातळ्यांचा संग्रह ?
| आयन | विद्युतभार | पातळ्या |
|---|---|---|
| F I | 0 | 303 |
| F II | +1 | 291 |
| F III | +2 | 278 |
| F IV | +3 | 170 |
| F V | +4 | 138 |
| F VI | +5 | 100 |
| F VII | +6 | 77 |
| F VIII | +7 | 151 |
| F IX | +8 | 149 |
आयनिक त्रिज्या
| विद्युतभार | समन्वय | प्रचक्रण | त्रिज्या |
|---|---|---|---|
| -1 | 2 | उपलब्ध नाही | 128.5 pm |
| -1 | 3 | उपलब्ध नाही | 130 pm |
| -1 | 4 | उपलब्ध नाही | 131 pm |
| -1 | 6 | उपलब्ध नाही | 133 pm |
| +7 | 6 | उपलब्ध नाही | 8 pm |
संयुगे
समस्थानिके (1)
| वस्तुमानांक | अणुवस्तुमान (u) | नैसर्गिक विपुलता | अर्धायुष्य | क्षय प्रकार | |
|---|---|---|---|---|---|
| 19 स्थिर | १८.९९८४०३१६२७३ ± ०.०००००००००९२ | 100.0000% | स्थिर | stable |
वर्णरेषा
| तरंगलांबी (nm) | तीव्रता | आयनीकरण टप्पा | प्रकार | संक्रमण | अचूकता | स्रोत | |
|---|---|---|---|---|---|---|---|
| 383.22 nm | उपलब्ध नाही | F V | emission | 2s.2p.(3P*).4d 2F* → 2p2.(1D).3d 2D | मोजलेले | NIST | |
| 384.7086 nm | 270 | F II | emission | 2s2.2p3.(4S*).3s 5S* → 2s2.2p3.(4S*).3p 5P | मोजलेले | NIST | |
| 384.9985 nm | 260 | F II | emission | 2s2.2p3.(4S*).3s 5S* → 2s2.2p3.(4S*).3p 5P | मोजलेले | NIST | |
| 385.1668 nm | 250 | F II | emission | 2s2.2p3.(4S*).3s 5S* → 2s2.2p3.(4S*).3p 5P | मोजलेले | NIST | |
| 385.69 nm | उपलब्ध नाही | F VI | emission | 1s2.2s.3s 1S → 1s2.2s.3p 3P* | मोजलेले | NIST | |
| 385.712 nm | उपलब्ध नाही | F V | emission | 2p2.(3P).3p 4S* → 2p2.(3P).3d 4P | मोजलेले | NIST | |
| 387.086 nm | उपलब्ध नाही | F V | emission | 2p2.(3P).3p 4S* → 2p2.(3P).3d 4P | मोजलेले | NIST | |
| 388.508 nm | उपलब्ध नाही | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | मोजलेले | NIST | |
| 388.6 nm | उपलब्ध नाही | F VII | emission | 1s2.7f 2F* → 1s2.8g 2G | मोजलेले | NIST | |
| 388.6 nm | उपलब्ध नाही | F VII | emission | 1s2.7f 2F* → 1s2.8g 2G | मोजलेले | NIST | |
| 388.6 nm | उपलब्ध नाही | F VII | emission | 1s2.7f 2F* → 1s2.8g 2G | मोजलेले | NIST | |
| 389.2 nm | उपलब्ध नाही | F VII | emission | 1s2.7f 2F* → 1s2.8d 2D | मोजलेले | NIST | |
| 389.2 nm | उपलब्ध नाही | F VII | emission | 1s2.7f 2F* → 1s2.8d 2D | मोजलेले | NIST | |
| 389.2 nm | उपलब्ध नाही | F VII | emission | 1s2.7f 2F* → 1s2.8d 2D | मोजलेले | NIST | |
| 390.229 nm | उपलब्ध नाही | F V | emission | 2p2.(3P).3p 4S* → 2p2.(3P).3d 4P | मोजलेले | NIST | |
| 390.45 nm | उपलब्ध नाही | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | मोजलेले | NIST | |
| 394.51 nm | उपलब्ध नाही | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2F | मोजलेले | NIST | |
| 394.51 nm | उपलब्ध नाही | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2F | मोजलेले | NIST | |
| 394.51 nm | उपलब्ध नाही | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2F | मोजलेले | NIST | |
| 394.518 nm | उपलब्ध नाही | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | मोजलेले | NIST | |
| 394.736 nm | उपलब्ध नाही | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | मोजलेले | NIST | |
| 396.08 nm | उपलब्ध नाही | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | मोजलेले | NIST | |
| 396.113 nm | उपलब्ध नाही | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | मोजलेले | NIST | |
| 399.6 nm | उपलब्ध नाही | F VII | emission | 1s2.7d 2D → 1s2.8p 2P* | मोजलेले | NIST | |
| 399.6 nm | उपलब्ध नाही | F VII | emission | 1s2.7d 2D → 1s2.8p 2P* | मोजलेले | NIST | |
| 399.6 nm | उपलब्ध नाही | F VII | emission | 1s2.7d 2D → 1s2.8p 2P* | मोजलेले | NIST | |
| 399.692 nm | उपलब्ध नाही | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | मोजलेले | NIST | |
| 399.692 nm | उपलब्ध नाही | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | मोजलेले | NIST | |
| 400.26 nm | उपलब्ध नाही | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | मोजलेले | NIST | |
| 400.942 nm | उपलब्ध नाही | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | मोजलेले | NIST | |
| 402.4726 nm | 240 | F II | emission | 2s2.2p3.(4S*).3s 3S* → 2s2.2p3.(4S*).3p 3P | मोजलेले | NIST | |
| 402.501 nm | 220 | F II | emission | 2s2.2p3.(4S*).3s 3S* → 2s2.2p3.(4S*).3p 3P | मोजलेले | NIST | |
| 402.5491 nm | 230 | F II | emission | 2s2.2p3.(4S*).3s 3S* → 2s2.2p3.(4S*).3p 3P | मोजलेले | NIST | |
| 405.99 nm | उपलब्ध नाही | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | मोजलेले | NIST | |
| 405.99 nm | उपलब्ध नाही | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | मोजलेले | NIST | |
| 410.3075 nm | 190 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | मोजलेले | NIST | |
| 410.3213 nm | 170 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | मोजलेले | NIST | |
| 410.3506 nm | 200 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | मोजलेले | NIST | |
| 410.3713 nm | 180 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | मोजलेले | NIST | |
| 410.387 nm | 170 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | मोजलेले | NIST | |
| 410.4008 nm | उपलब्ध नाही | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | मोजलेले | NIST | |
| 410.916 nm | 170 | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | मोजलेले | NIST | |
| 411.03 nm | उपलब्ध नाही | F VI | emission | 1s2.2s.3p 1P* → 1s2.2s.3d 3D | मोजलेले | NIST | |
| 411.272 nm | उपलब्ध नाही | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | मोजलेले | NIST | |
| 411.2969 nm | उपलब्ध नाही | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | मोजलेले | NIST | |
| 411.44 nm | उपलब्ध नाही | F VI | emission | 1s2.2s.3p 1P* → 1s2.2s.3d 3D | मोजलेले | NIST | |
| 411.6535 nm | 160 | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | मोजलेले | NIST | |
| 411.699 nm | उपलब्ध नाही | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | मोजलेले | NIST | |
| 411.8752 nm | उपलब्ध नाही | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | मोजलेले | NIST | |
| 411.9207 nm | 150 | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | मोजलेले | NIST | |
| 415.775 nm | उपलब्ध नाही | F II | emission | 2s2.2p4 1D → 2s2.2p4 1S | मोजलेले | NIST | |
| 423.3 nm | उपलब्ध नाही | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | मोजलेले | NIST | |
| 424.76 nm | उपलब्ध नाही | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | मोजलेले | NIST | |
| 426.19 nm | उपलब्ध नाही | F V | emission | 2s.2p.(3P*).3p 2D → 2s.2p.(3P*).3d 2D* | मोजलेले | NIST | |
| 426.28 nm | उपलब्ध नाही | F VI | emission | 1s2.2s.3s 1S → 1s2.2s.3p 1P* | मोजलेले | NIST | |
| 427.32 nm | उपलब्ध नाही | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | मोजलेले | NIST | |
| 427.94 nm | उपलब्ध नाही | F V | emission | 2s.2p.(3P*).3p 2D → 2s.2p.(3P*).3d 2D* | मोजलेले | NIST | |
| 429.9165 nm | 200 | F II | emission | 2s2.2p3.(2D*).3s 1D* → 2s2.2p3.(2D*).3p 1F | मोजलेले | NIST | |
| 432.27 nm | उपलब्ध नाही | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | मोजलेले | NIST | |
| 433.94 nm | उपलब्ध नाही | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | मोजलेले | NIST | |
| 435.28 nm | उपलब्ध नाही | F V | emission | 2s.2p.(3P*).3p 2D → 2s.2p.(3P*).3d 2D* | मोजलेले | NIST | |
| 437.11 nm | उपलब्ध नाही | F V | emission | 2s.2p.(3P*).3p 2D → 2s.2p.(3P*).3d 2D* | मोजलेले | NIST | |
| 439.05 nm | उपलब्ध नाही | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | मोजलेले | NIST | |
| 444.6527 nm | 160 | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | मोजलेले | NIST | |
| 444.6689 nm | उपलब्ध नाही | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | मोजलेले | NIST | |
| 444.6721 nm | 170 | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | मोजलेले | NIST | |
| 444.7117 nm | उपलब्ध नाही | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | मोजलेले | NIST | |
| 444.7148 nm | उपलब्ध नाही | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | मोजलेले | NIST | |
| 444.7188 nm | 180 | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | मोजलेले | NIST | |
| 455.99 nm | उपलब्ध नाही | F VI | emission | 1s2.2p.3p 1D → 1s2.2p.3d 1F* | मोजलेले | NIST | |
| 456.45 nm | उपलब्ध नाही | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | मोजलेले | NIST | |
| 457.45 nm | उपलब्ध नाही | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | मोजलेले | NIST | |
| 457.96 nm | उपलब्ध नाही | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | मोजलेले | NIST | |
| 459.81 nm | उपलब्ध नाही | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | मोजलेले | NIST | |
| 460.57 nm | उपलब्ध नाही | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | मोजलेले | NIST | |
| 461.08 nm | उपलब्ध नाही | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | मोजलेले | NIST | |
| 463.41 nm | उपलब्ध नाही | F VI | emission | 1s2.2p.4p 1P → 1s2.2p.4d 1P* | मोजलेले | NIST | |
| 478.945 nm | उपलब्ध नाही | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | मोजलेले | NIST | |
| 478.945 nm | उपलब्ध नाही | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | मोजलेले | NIST | |
| 486.899 nm | उपलब्ध नाही | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | मोजलेले | NIST | |
| 486.899 nm | उपलब्ध नाही | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | मोजलेले | NIST | |
| 490.456 nm | उपलब्ध नाही | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | मोजलेले | NIST | |
| 507.4 nm | उपलब्ध नाही | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | मोजलेले | NIST | |
| 507.86 nm | उपलब्ध नाही | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | मोजलेले | NIST | |
| 509.78 nm | उपलब्ध नाही | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | मोजलेले | NIST | |
| 510.25 nm | उपलब्ध नाही | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | मोजलेले | NIST | |
| 511.78 nm | उपलब्ध नाही | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | मोजलेले | NIST | |
| 515.72 nm | उपलब्ध नाही | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | मोजलेले | NIST | |
| 517.29 nm | उपलब्ध नाही | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | मोजलेले | NIST | |
| 517.4 nm | उपलब्ध नाही | F VIII | emission | 1s.3s 3S → 1s.3p 3P* | मोजलेले | NIST | |
| 522.95 nm | उपलब्ध नाही | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | मोजलेले | NIST | |
| 525.1 nm | उपलब्ध नाही | F VIII | emission | 1s.3s 3S → 1s.3p 3P* | मोजलेले | NIST | |
| 528.03 nm | उपलब्ध नाही | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2D | मोजलेले | NIST | |
| 528.03 nm | उपलब्ध नाही | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2D | मोजलेले | NIST | |
| 528.03 nm | उपलब्ध नाही | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2D | मोजलेले | NIST | |
| 528.03 nm | उपलब्ध नाही | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2D | मोजलेले | NIST | |
| 533.07 nm | उपलब्ध नाही | F VI | emission | 1s2.2p.3p 1S → 1s2.2p.3d 1P* | मोजलेले | NIST | |
| 543.21 nm | उपलब्ध नाही | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | मोजलेले | NIST | |
| 544 nm | उपलब्ध नाही | F VII | emission | 1s2.8p 2P* → 1s2.9d 2D | मोजलेले | NIST | |
| 544 nm | उपलब्ध नाही | F VII | emission | 1s2.8p 2P* → 1s2.9d 2D | मोजलेले | NIST | |
| 544 nm | उपलब्ध नाही | F VII | emission | 1s2.8p 2P* → 1s2.9d 2D | मोजलेले | NIST | |
| 545.91 nm | उपलब्ध नाही | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | मोजलेले | NIST | |
| 549.84 nm | उपलब्ध नाही | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | मोजलेले | NIST | |
| 549.99 nm | उपलब्ध नाही | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | मोजलेले | NIST | |
| 556.76 nm | उपलब्ध नाही | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | मोजलेले | NIST | |
| 560.85 nm | उपलब्ध नाही | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | मोजलेले | NIST | |
| 568.67 nm | उपलब्ध नाही | F V | emission | 2s.2p.(3P*).3s 2P* → 2s.2p.(3P*).3p 2P | मोजलेले | NIST | |
| 572.12 nm | उपलब्ध नाही | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | मोजलेले | NIST | |
| 572.12 nm | उपलब्ध नाही | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | मोजलेले | NIST | |
| 572.15 nm | उपलब्ध नाही | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | मोजलेले | NIST | |
| 573.29 nm | उपलब्ध नाही | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | मोजलेले | NIST | |
| 573.29 nm | उपलब्ध नाही | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | मोजलेले | NIST | |
| 573.32 nm | उपलब्ध नाही | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | मोजलेले | NIST | |
| 573.32 nm | उपलब्ध नाही | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | मोजलेले | NIST | |
| 576.14 nm | उपलब्ध नाही | F V | emission | 2s.2p.(3P*).3s 2P* → 2s.2p.(3P*).3p 2P | मोजलेले | NIST | |
| 585.63 nm | उपलब्ध नाही | F V | emission | 2s.2p.(3P*).3s 2P* → 2s.2p.(3P*).3p 2P | मोजलेले | NIST | |
| 593.55 nm | उपलब्ध नाही | F V | emission | 2s.2p.(3P*).3s 2P* → 2s.2p.(3P*).3p 2P | मोजलेले | NIST | |
| 604 nm | उपलब्ध नाही | F VII | emission | 1s2.8d 2D → 1s2.9p 2P* | मोजलेले | NIST | |
| 604 nm | उपलब्ध नाही | F VII | emission | 1s2.8d 2D → 1s2.9p 2P* | मोजलेले | NIST | |
| 604 nm | उपलब्ध नाही | F VII | emission | 1s2.8d 2D → 1s2.9p 2P* | मोजलेले | NIST | |
| 683 nm | उपलब्ध नाही | F VII | emission | 1s2.9p 2P* → 1s2.10d 2D | मोजलेले | NIST | |
| 683 nm | उपलब्ध नाही | F VII | emission | 1s2.9p 2P* → 1s2.10d 2D | मोजलेले | NIST | |
| 683 nm | उपलब्ध नाही | F VII | emission | 1s2.9p 2P* → 1s2.10d 2D | मोजलेले | NIST | |
| 713.8 nm | उपलब्ध नाही | F V | emission | 2s.2p.(3P*).4p 2D → 2s.2p.(3P*).4d 2F* | मोजलेले | NIST | |
| 719.4 nm | उपलब्ध नाही | F V | emission | 2s.2p.(3P*).4p 2D → 2s.2p.(3P*).4d 2F* | मोजलेले | NIST | |
| 723.4 nm | उपलब्ध नाही | F VI | emission | 1s2.2p.4s 1P* → 1s2.2p.4p 1D | मोजलेले | NIST | |
| 728.5 nm | उपलब्ध नाही | F VIII | emission | 1s.3s 1S → 1s.3p 1P* | मोजलेले | NIST | |
| 735.8 nm | उपलब्ध नाही | F V | emission | 2s.2p.(3P*).4p 2D → 2s.2p.(3P*).4d 2F* | मोजलेले | NIST |
विस्तारित गुणधर्म
सहसंयुजी त्रिज्या (विस्तारित)
- सहसंयुजी त्रिज्या (प्युक्को)
- 64 pm
- सहसंयुजी त्रिज्या (प्युक्को, दुहेरी बंध)
- 59 pm
- सहसंयुजी त्रिज्या (प्युक्को, तिहेरी बंध)
- 53 pm
- सहसंयुजी त्रिज्या (ब्रॅग)
- 67 pm
व्हॅन डर वाल्स त्रिज्या
- Bondi
- 147 pm
- Batsanov
- 150 pm
- Alvarez
- 146 pm
- UFF
- 336.4 pm
- MM3
- 171 pm
- Dreiding
- 347.2 pm
- Rowland–Taylor
- 146 pm
अणुत्रिज्या आणि धात्विक त्रिज्या
- अणुत्रिज्या (राह्म)
- 163 pm
क्रमांकन मापनपट्ट्या
- Mendeleev
- 106
- Pettifor
- 102
- Glawe
- 102
विद्युतऋणता मापनपट्ट्या
- Ghosh
- 0
- Gunnarsson–Lundqvist
- 11
- Robles–Bartolotti
- 10
ध्रुवणक्षमता आणि अपस्करण
- द्विध्रुव ध्रुवणक्षमता
- 3.74 a.u.
- द्विध्रुव ध्रुवणक्षमता (अनिश्चितता)
- 0.08 a.u.
- C₆
- 9.52 Ha·Bohr6
- C₆ (Gould–Bučko)
- 10.2 Ha·Bohr6
रासायनिक आसक्ती
- प्रोटॉन आसक्ती
- 340.1 kJ/mol
- वायूची क्षारकता
- 315.1 kJ/mol
पुरवठा जोखीम आणि अर्थकारण
- उत्पादनाचे केंद्रीकरण
- 56
- सापेक्ष पुरवठा जोखीम
- 7
- साठ्यांचे वितरण
- 17
- राजकीय स्थैर्य (प्रमुख उत्पादक)
- 24
- राजकीय स्थैर्य (सर्वाधिक साठे असलेला देश)
- 44
अवस्थांतरे आणि अपरूपे
| द्रवणांक | 53.48 K |
| उत्कलनांक | 85.04 K |
| क्रांतिक बिंदू (तापमान) | 144.41 K |
| क्रांतिक बिंदू (दाब) | 5.17 MPa |
| त्रिक बिंदू (तापमान) | 53.48 K |
| त्रिक बिंदू (दाब) | 90 kPa |
ऑक्सिडीकरण अवस्थांचे वर्ग
प्रगत संदर्भ माहिती
परिरक्षण स्थिरांक (3)
| n | कक्षिका | σ |
|---|---|---|
| 1 | s | 0.3499 |
| 2 | p | 3.9 |
| 2 | s | 3.8724 |
स्फटिक त्रिज्यांचा तपशील (5)
| विद्युतभार | CN | प्रचक्रण | rcrystal (pm) | उत्पत्ती |
|---|---|---|---|---|
| -1 | II | 114.5 | ||
| -1 | III | 116 | ||
| -1 | IV | 117 | ||
| -1 | VI | 119 | ||
| 7 | VI | 22 | Ahrens (1952) ionic radius, |
समस्थानिक क्षय प्रकार (31)
| समस्थानिक | मोड | तीव्रता |
|---|---|---|
| 13 | p | — |
| 14 | p | — |
| 15 | p | 100% |
| 16 | p | 100% |
| 17 | B+ | 100% |
| 18 | B+ | 100% |
| 20 | B- | 100% |
| 21 | B- | 100% |
| 22 | B- | 100% |
| 22 | B-n | 11% |
क्ष-किरण प्रकीर्णन गुणक (502)
| ऊर्जा (eV) | f₁ | f₂ |
|---|---|---|
| 10 | — | 0.05165 |
| 10.1617 | — | 0.05648 |
| 10.3261 | — | 0.06176 |
| 10.4931 | — | 0.06754 |
| 10.6628 | — | 0.07386 |
| 10.8353 | — | 0.08077 |
| 11.0106 | — | 0.08833 |
| 11.1886 | — | 0.09659 |
| 11.3696 | — | 0.10831 |
| 11.5535 | — | 0.12462 |
अतिरिक्त माहिती
Estimated Crustal Abundance
The estimated element abundance in the earth's crust.
5.85×102 milligrams per kilogram
संदर्भ (1)
- [5] Fluorine https://education.jlab.org/itselemental/ele009.html
Estimated Oceanic Abundance
The estimated element abundance in the earth's oceans.
1.3 milligrams per liter
संदर्भ (1)
- [5] Fluorine https://education.jlab.org/itselemental/ele009.html
संदर्भ
(9)
Data deposited in or computed by PubChem
The half-life and atomic mass data was provided by the Atomic Mass Data Center at the International Atomic Energy Agency.
Element data are cited from the Atomic weights of the elements (an IUPAC Technical Report). The IUPAC periodic table of elements can be found at https://iupac.org/what-we-do/periodic-table-of-elements/. Additional information can be found within IUPAC publication doi:10.1515/pac-2015-0703 Copyright © 2020 International Union of Pure and Applied Chemistry.
The information are cited from Pure Appl. Chem. 2018; 90(12): 1833-2092, https://doi.org/10.1515/pac-2015-0703.
Thomas Jefferson National Accelerator Facility (Jefferson Lab) is one of 17 national laboratories funded by the U.S. Department of Energy. The lab's primary mission is to conduct basic research of the atom's nucleus using the lab's unique particle accelerator, known as the Continuous Electron Beam Accelerator Facility (CEBAF). For more information visit https://www.jlab.org/
The periodic table at the LANL (Los Alamos National Laboratory) contains basic element information together with the history, source, properties, use, handling and more. The provenance data may be found from the link under the source name.
The periodic table contains NIST's critically-evaluated data on atomic properties of the elements. The provenance data that include data for atomic spectroscopy, X-ray and gamma ray, radiation dosimetry, nuclear physics, and condensed matter physics may be found from the link under the source name. Ref: https://www.nist.gov/pml/atomic-spectra-database
This section provides all form of data related to element Fluorine.
The element property data was retrieved from publications.