Fluorine (F)
halogenGas
표준 원자량
18.998403 u전자 배치
[He] 2s2 2p5녹는점
-219.62 °C끓는점
-188.12 °C밀도
1.696 kg/m³산화 상태
-1전기 음성도(Pauling)
3.98제1 이온화 에너지
17.42282 eV발견 연도
1886원자 반지름
50 pm상세 정보
Fluorine is the lightest halogen and the most electronegative chemical element. In elemental form it occurs as diatomic fluorine, F₂, a highly reactive oxidizing gas. Natural fluorine is almost entirely the stable isotope ¹⁹F and is found in minerals rather than as the free element. Its chemistry underlies fluoride minerals, uranium enrichment chemistry, fluoropolymers, refrigerants, many agrochemicals, and a large share of modern medicinal chemistry.
Fluorine is the most electronegative and reactive of all elements. It is a pale yellow, corrosive gas, which reacts with most organic and inorganic substances. Finely divided metals, glass, ceramics, carbon, and even water burn in fluorine with a bright flame.
Until World War II, there was no commercial production of elemental fluorine. The nuclear bomb project and nuclear energy applications, however, made it necessary to produce large quantities.
The name derives from the Latin fluere for "flow" or "flux" because fluorite (CaF2) was used as a flux in metallurgy owing to its low melting point. It was discovered in hydrofluoric acid by the Swedish pharmacist and chemist Carl-Wilhelm Scheele in 1771, but it was not isolated until 1886 by the French pharmacist and chemist Henri Moissan.
Fluorine is the most reactive of all elements and no chemical substance is capable of freeing fluorine from any of its compounds. For this reason, fluorine does not occur free in nature and was extremely difficult for scientists to isolate. The first recorded use of a fluorine compound dates to around 1670 to a set of instructions for etching glass that called for Bohemian emerald (CaF2). Chemists attempted to identify the material that was capable of etching glass and George Gore was able to produce a small amount of fluorine through an electrolytic process in 1869. Unknown to Gore, fluorine gas explosively combines with hydrogen gas. That is exactly what happened in Gore's experiment when the fluorine gas that formed on one electrode combined with the hydrogen gas that formed on the other electrode. Ferdinand Frederic Henri Moissan, a French chemist, was the first to successfully isolate fluorine in 1886. He did this through the electrolysis of potassium fluoride (KF) and hydrofluoric acid (HF). He also completely isolated the fluorine gas from the hydrogen gas and he built his electrolysis device completely from platinum. His work was so impressive that he was awarded the Nobel Prize for chemistry in 1906. Today, fluorine is still produced through the electrolysis of potassium fluoride and hydrofluoric acid as well as through the electrolysis of molten potassium acid fluoride (KHF2).
From the Latin and French fluere: flow or flux. In 1529, Georigius Agricola described the use of fluorspar as a flux, and as early as 1670 Schwandhard found that glass was etched when exposed to fluorspar treated with acid. Scheele and many later investigators, including Davy, Gay-Lussac, Lavoisier, and Thenard, experimented with hydrofluoric acid, some experiments ending tragically.
The element was finally isolated in 1866 by Moissan after nearly 74 years of continuous effort.
Pure fluorine, F₂, is a pale yellow gas at ordinary temperature and pressure. It condenses to a yellow liquid and freezes to a pale solid at low temperature. The gas has a sharp, irritating odor, but odor is not a safe means of detection.
Elemental fluorine, F₂, is used mainly where its extreme oxidizing and fluorinating power is required, including preparation of uranium hexafluoride, UF₆, for isotope separation and manufacture of some specialty inorganic fluorides. Much larger practical importance lies in fluorine-containing compounds. Fluoropolymers such as polytetrafluoroethylene, (C₂F₄)ₙ, are used for chemically resistant coatings, seals, membranes, and electrical insulation. Fluoride compounds are used in glass etching, aluminum production, dental products, pharmaceuticals, and crop-protection chemicals.
Fluorine is added to city water supplies in the proportion of about one part per million to help prevent tooth decay. Sodium fluoride (NaF), stannous(II) fluoride (SnF2) and sodium monofluorophosphate (Na2PO3F) are all fluorine compounds added to toothpaste, also to help prevent tooth decay. Hydrofluoric acid (HF) is used to etch glass, including most of the glass used in light bulbs. Uranium hexafluoride (UF6) is used to separate isotopes of uranium. Crystals of calcium fluoride (CaF2), also known as fluorite and fluorspar, are used to make lenses to focus infrared light. Fluorine joins with carbon to form a class of compounds known as fluorocarbons. Some of these compounds, such as dichlorodifluoromethane (CF2Cl2), were widely used in air conditioning and refrigeration systems and in aerosol spray cans, but have been phased out due to the damage they were causing to the earth's ozone layer.
Fluorine and its compounds are used in producing uranium (from the hexafluoride) and more than 100 commercial fluorochemicals, including many high-temperature plastics. Hydrofluoric acid etches glass of light bulbs. Fluorochlorohydrocarbons are extensively used in air conditioning and refrigeration.
The presence of fluorine as a soluble fluoride in drinking water to the extent of 2 ppm may cause mottled enamel in teeth when used by children acquiring permanent teeth; in smaller amounts, however, fluoride helps prevent dental cavities.
Elemental fluorine has been studied as a rocket propellant as it has an exceptionally high specific impulse value.
Isotopes in Medicine
18F is a radioactive fluorine isotope that is used in an 18F-FDG compound (18F-labeled, fluoro-deoxy glucose) for imaging the organs, bones, tissues, and brain of the body with a technique called positron emission topography (PET). The 18F-FDG compound is injected and the isotopically labeled glucose is consumed by any cell requiring glucose as a source of energy [98] R. Krebs. The History And Use Of Our Earth’s Chemical Elements: A Reference Guide, 2nd ed. Greenwood Press, Westport, CT (2006)., [99] World Nuclear Association. Radioisotopes in Medicine, World Nuclear Association (2014), Feb. 23; http://www.world-nuclear.org/info/inf55.html..
– 18F emits positrons that collect in tissue and interact with regular negative electrons when injected into the body. The positrons and electrons annihilate each other, producing two gamma rays that are emitted in opposite directions. The radiation is detected on a PET camera, which generates a picture of the body part being examined (Fig. IUPAC.9.1).
–Because 18F has a short half-life of about 110 min, there is little chance of radiation damage to the patient.
Fluorine most commonly has oxidation state −1 in compounds, as in hydrogen fluoride, HF, sodium fluoride, NaF, and calcium fluoride, CaF₂. With highly electropositive elements it forms ionic fluorides; with nonmetals it forms strongly covalent fluorides such as sulfur hexafluoride, SF₆, and silicon tetrafluoride, SiF₄. Fluorine can also form interhalogen compounds, including chlorine trifluoride, ClF₃. Oxygen fluorides such as oxygen difluoride, OF₂, are unusual because fluorine is assigned the negative oxidation state while oxygen is positive.
One hypothesis says that fluorine can be substituted for hydrogen wherever it occurs in organic compounds, which could lead to an astronomical number of new fluorine compounds. Compounds of fluorine with rare gases have now been confirmed in fluorides of xenon, radon, and krypton.
See more information at the Fluorine compound page.
Elemental fluorine, F₂, is acutely toxic, corrosive, and a powerful oxidizer that can ignite or violently react with many materials. Hydrogen fluoride, HF, is especially hazardous because it penetrates tissue and binds calcium and magnesium ions. Soluble fluorides can be toxic at sufficient dose, while controlled low concentrations of fluoride ion, F⁻, have dental uses. Some fluorinated gases are chemically stable but may be asphyxiants or potent greenhouse gases.
Elemental fluorine and the fluoride ion are highly toxic. The free element has a characteristic pungent odor, detectable in concentrations as low as 20 ppb, which is below the safe working level. The recommended maximum allowable concentration for a daily 8-hour time-weighted exposure is 1 ppm.
Fluorine enters the environment chiefly as fluoride in minerals, volcanic emissions, sea spray, industrial releases, and weathering products. Fluoride ion, F⁻, binds to calcium, aluminum, and iron phases and can be immobilized in soils or sediments, though mobility depends strongly on pH and water chemistry. Elevated natural or industrial fluoride in groundwater can affect teeth, bones, livestock, and vegetation. Persistent organofluorine compounds vary widely in mobility and degradation behavior.
Fluorine supply is based primarily on mining fluorite, CaF₂, with smaller contributions from fluorapatite-bearing phosphate rock processed in fertilizer production. Hydrogen fluoride, HF, is the central industrial intermediate, made by treating fluorite with sulfuric acid, H₂SO₄. Direct production and transport of elemental fluorine are limited by its reactivity, so it is commonly generated or consumed close to the point of use. Demand is tied to aluminum smelting, chemical manufacturing, electronics materials, fluoropolymers, and regulated refrigerant transitions. Recycling is important for some fluorinated materials but is often chemically or economically difficult.
Found in the minerals fluorite (CaF2) and cryolite(Na3AlF6). Electrolysis of hydrofluoric acid (HF) or potassium acid fluoride (KHF2) is the only practical method of commercial production.
Fluorine is relatively rare in the cosmos compared with neighboring light elements. It is thought to be made in several settings, including helium-burning regions of evolved stars, neutrino-driven processes in core-collapse supernovae, and possibly novae, with their relative contributions still studied. In planetary materials it is concentrated into minerals, melts, and volatile-bearing phases rather than remaining as free F₂.
- Fluorine has only one stable natural isotope, ¹⁹F.
- Fluorite, CaF₂, gave the element its name through its use as a flux.
- Glass etching by hydrogen fluoride, HF, reflects the strength of silicon-fluorine bonding.
- Polytetrafluoroethylene, (C₂F₄)ₙ, was discovered accidentally during refrigerant research.
- Uranium hexafluoride, UF₆, is volatile enough for gas-phase isotope enrichment.
- Fluoride minerals can preserve fluorine in rocks over geologic time.
이미지
특성
물리적 특성
- 원자 반지름(경험값)
- 50 pm 모든 원소의 원자 반지름(경험값) 비교 →
- 공유 결합 반지름
- 57 pm 모든 원소의 공유 결합 반지름 비교 →
- 반데르발스 반지름
- 135 pm 모든 원소의 반데르발스 반지름 비교 →
- 밀도
- 1.696 kg/m³ 모든 원소의 밀도 비교 →
- 몰 부피
- 0.0171 L/mol
- STP에서의 상
- 기체 모든 원소의 STP에서의 상 비교 →
- 녹는점
- -219.62 °C 모든 원소의 녹는점 비교 →
- 끓는점
- -188.12 °C 모든 원소의 끓는점 비교 →
- 열전도율
- 0.028 W/(m·K) 모든 원소의 열전도율 비교 →
- 비열
- 0.824 J/(g·K) 모든 원소의 비열 비교 →
- 몰 열용량
- 31.304 J/(mol·K) 모든 원소의 몰 열용량 비교 →
- 결정 구조
- 단사 모든 원소의 결정 구조 비교 →
화학적 특성
- 전기 음성도(Pauling)
- 3.98 모든 원소의 전기 음성도(Pauling) 비교 →
- 전기 음성도(Allen)
- 4.193
- 전자 친화도
- 3.4011 eV
- 제1 이온화 에너지
- 17.42282 eV 모든 원소의 제1 이온화 에너지 비교 →
- 제2 이온화 에너지
- 34.97093 eV 모든 원소의 제2 이온화 에너지 비교 →
- 제3 이온화 에너지
- 62.708196 eV 모든 원소의 제3 이온화 에너지 비교 →
- 제4 이온화 에너지
- 87.1753 eV 모든 원소의 제4 이온화 에너지 비교 →
- 제5 이온화 에너지
- 114.249393 eV 모든 원소의 제5 이온화 에너지 비교 →
- 산화 상태
- -1 모든 원소의 산화 상태 비교 →
- 원자가 전자
- 7 모든 원소의 원자가 전자 비교 →
- 전자 배치
- [He] 2s2 2p5
열역학적 특성
- 삼중점(온도)
- -219.67 °C
- 삼중점(압력)
- 9e+4 Pa
- 임계점(온도)
- -128.74 °C
- 임계점(압력)
- 5.1724e+6 Pa
- 융해열
- 0.0026429 eV 모든 원소의 융해열 비교 →
- 기화열
- 0.06778256 eV 모든 원소의 기화열 비교 →
- 원자화열
- 0.8228222 eV
- 원자화 엔탈피
- 0.82225216 eV
핵 특성
- 양성자 수
- 9 모든 원소의 양성자 수 비교 →
- 중성자 수
- 10 모든 원소의 중성자 수 비교 →
- 알려진 동위원소 수
- 19 모든 원소의 알려진 동위원소 수 비교 →
- 안정 동위원소 수
- 1 모든 원소의 안정 동위원소 수 비교 →
- 가장 안정한 동위원소
- F-19
- 발견 연도
- 1886
존재비
- 존재비(지각)
- 585 mg/kg 모든 원소의 존재비(지각) 비교 →
- 존재비(해양)
- 1.3 mg/L 모든 원소의 존재비(해양) 비교 →
결정 구조
해당 없음
전자 구조
- 전자껍질별 전자 수
- 2, 7 모든 원소의 전자껍질별 전자 수 비교 →
식별자
- CAS 등록 번호
- 7782-41-4 모든 원소의 CAS 등록 번호 비교 →
- 항 기호
- 2P°3/2
- InChI
- InChI=1S/F
- InChI 키
- YCKRFDGAMUMZLT-UHFFFAOYSA-N
전자 배치 측정값
F: 2s² 2p⁵[He] 2s² 2p⁵1s² 2s² 2p⁵원자 모형
동위원소에 따라 중성자 수, 질량, 안정성은 달라지지만, 중성 원자의 전자 배치는 달라지지 않습니다.
개략적인 원자 모형이며 실제 비율과 다릅니다.
원자 지문
방출 / 흡수 스펙트럼
동위원소 분포
| 질량수 | 원자 질량(u) | 천연 존재비 | 반감기 |
|---|---|---|---|
| 19 안정 | 18.99840316273 ± 0.00000000092 | 100.0000% | 안정 |
상 / 상태
이유: 끓는점(-188.12 °C)보다 213.1 °C 높음
개략도이며 실제 비율과 다름
상전이점
전이 에너지
녹는점에서 1 mol을 녹이는 데 필요한 에너지
끓는점에서 1 mol을 기화시키는 데 필요한 에너지
밀도
표준 조건에서
현재 온도 T에서 이상 기체 법칙으로 추정
심화
원자 스펙트럼
보유 스펙트럼선 데이터 ?
| 이온 | 전하 | 총 스펙트럼선 수 | 전이 확률 | 준위 표기 |
|---|---|---|---|---|
| F I | 0 | 162 | 120 | 162 |
| F II | +1 | 150 | 67 | 67 |
| F III | +2 | 141 | 34 | 34 |
| F IV | +3 | 75 | 30 | 30 |
| F V | +4 | 513 | 472 | 472 |
| F VI | +5 | 269 | 269 | 269 |
| F VII | +6 | 470 | 439 | 470 |
| F VIII | +7 | 128 | 128 | 128 |
| F IX | +8 | 137 | 137 | 137 |
보유 에너지 준위 데이터 ?
| 이온 | 전하 | 준위 |
|---|---|---|
| F I | 0 | 303 |
| F II | +1 | 291 |
| F III | +2 | 278 |
| F IV | +3 | 170 |
| F V | +4 | 138 |
| F VI | +5 | 100 |
| F VII | +6 | 77 |
| F VIII | +7 | 151 |
| F IX | +8 | 149 |
이온 반지름
| 전하 | 배위 | 스핀 | 반지름 |
|---|---|---|---|
| -1 | 2 | 해당 없음 | 128.5 pm |
| -1 | 3 | 해당 없음 | 130 pm |
| -1 | 4 | 해당 없음 | 131 pm |
| -1 | 6 | 해당 없음 | 133 pm |
| +7 | 6 | 해당 없음 | 8 pm |
화합물
동위원소 (1)
| 질량수 | 원자 질량(u) | 천연 존재비 | 반감기 | 붕괴 방식 | |
|---|---|---|---|---|---|
| 19 안정 | 18.99840316273 ± 0.00000000092 | 100.0000% | 안정 | stable |
스펙트럼선
| 파장(nm) | 세기 | 이온화 단계 | 유형 | 전이 | 정확도 | 출처 | |
|---|---|---|---|---|---|---|---|
| 383.22 nm | 해당 없음 | F V | emission | 2s.2p.(3P*).4d 2F* → 2p2.(1D).3d 2D | 측정값 | NIST | |
| 384.7086 nm | 270 | F II | emission | 2s2.2p3.(4S*).3s 5S* → 2s2.2p3.(4S*).3p 5P | 측정값 | NIST | |
| 384.9985 nm | 260 | F II | emission | 2s2.2p3.(4S*).3s 5S* → 2s2.2p3.(4S*).3p 5P | 측정값 | NIST | |
| 385.1668 nm | 250 | F II | emission | 2s2.2p3.(4S*).3s 5S* → 2s2.2p3.(4S*).3p 5P | 측정값 | NIST | |
| 385.69 nm | 해당 없음 | F VI | emission | 1s2.2s.3s 1S → 1s2.2s.3p 3P* | 측정값 | NIST | |
| 385.712 nm | 해당 없음 | F V | emission | 2p2.(3P).3p 4S* → 2p2.(3P).3d 4P | 측정값 | NIST | |
| 387.086 nm | 해당 없음 | F V | emission | 2p2.(3P).3p 4S* → 2p2.(3P).3d 4P | 측정값 | NIST | |
| 388.508 nm | 해당 없음 | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | 측정값 | NIST | |
| 388.6 nm | 해당 없음 | F VII | emission | 1s2.7f 2F* → 1s2.8g 2G | 측정값 | NIST | |
| 388.6 nm | 해당 없음 | F VII | emission | 1s2.7f 2F* → 1s2.8g 2G | 측정값 | NIST | |
| 388.6 nm | 해당 없음 | F VII | emission | 1s2.7f 2F* → 1s2.8g 2G | 측정값 | NIST | |
| 389.2 nm | 해당 없음 | F VII | emission | 1s2.7f 2F* → 1s2.8d 2D | 측정값 | NIST | |
| 389.2 nm | 해당 없음 | F VII | emission | 1s2.7f 2F* → 1s2.8d 2D | 측정값 | NIST | |
| 389.2 nm | 해당 없음 | F VII | emission | 1s2.7f 2F* → 1s2.8d 2D | 측정값 | NIST | |
| 390.229 nm | 해당 없음 | F V | emission | 2p2.(3P).3p 4S* → 2p2.(3P).3d 4P | 측정값 | NIST | |
| 390.45 nm | 해당 없음 | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | 측정값 | NIST | |
| 394.51 nm | 해당 없음 | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2F | 측정값 | NIST | |
| 394.51 nm | 해당 없음 | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2F | 측정값 | NIST | |
| 394.51 nm | 해당 없음 | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2F | 측정값 | NIST | |
| 394.518 nm | 해당 없음 | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | 측정값 | NIST | |
| 394.736 nm | 해당 없음 | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | 측정값 | NIST | |
| 396.08 nm | 해당 없음 | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | 측정값 | NIST | |
| 396.113 nm | 해당 없음 | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | 측정값 | NIST | |
| 399.6 nm | 해당 없음 | F VII | emission | 1s2.7d 2D → 1s2.8p 2P* | 측정값 | NIST | |
| 399.6 nm | 해당 없음 | F VII | emission | 1s2.7d 2D → 1s2.8p 2P* | 측정값 | NIST | |
| 399.6 nm | 해당 없음 | F VII | emission | 1s2.7d 2D → 1s2.8p 2P* | 측정값 | NIST | |
| 399.692 nm | 해당 없음 | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | 측정값 | NIST | |
| 399.692 nm | 해당 없음 | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | 측정값 | NIST | |
| 400.26 nm | 해당 없음 | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | 측정값 | NIST | |
| 400.942 nm | 해당 없음 | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | 측정값 | NIST | |
| 402.4726 nm | 240 | F II | emission | 2s2.2p3.(4S*).3s 3S* → 2s2.2p3.(4S*).3p 3P | 측정값 | NIST | |
| 402.501 nm | 220 | F II | emission | 2s2.2p3.(4S*).3s 3S* → 2s2.2p3.(4S*).3p 3P | 측정값 | NIST | |
| 402.5491 nm | 230 | F II | emission | 2s2.2p3.(4S*).3s 3S* → 2s2.2p3.(4S*).3p 3P | 측정값 | NIST | |
| 405.99 nm | 해당 없음 | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | 측정값 | NIST | |
| 405.99 nm | 해당 없음 | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | 측정값 | NIST | |
| 410.3075 nm | 190 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | 측정값 | NIST | |
| 410.3213 nm | 170 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | 측정값 | NIST | |
| 410.3506 nm | 200 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | 측정값 | NIST | |
| 410.3713 nm | 180 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | 측정값 | NIST | |
| 410.387 nm | 170 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | 측정값 | NIST | |
| 410.4008 nm | 해당 없음 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | 측정값 | NIST | |
| 410.916 nm | 170 | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | 측정값 | NIST | |
| 411.03 nm | 해당 없음 | F VI | emission | 1s2.2s.3p 1P* → 1s2.2s.3d 3D | 측정값 | NIST | |
| 411.272 nm | 해당 없음 | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | 측정값 | NIST | |
| 411.2969 nm | 해당 없음 | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | 측정값 | NIST | |
| 411.44 nm | 해당 없음 | F VI | emission | 1s2.2s.3p 1P* → 1s2.2s.3d 3D | 측정값 | NIST | |
| 411.6535 nm | 160 | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | 측정값 | NIST | |
| 411.699 nm | 해당 없음 | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | 측정값 | NIST | |
| 411.8752 nm | 해당 없음 | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | 측정값 | NIST | |
| 411.9207 nm | 150 | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | 측정값 | NIST | |
| 415.775 nm | 해당 없음 | F II | emission | 2s2.2p4 1D → 2s2.2p4 1S | 측정값 | NIST | |
| 423.3 nm | 해당 없음 | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | 측정값 | NIST | |
| 424.76 nm | 해당 없음 | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | 측정값 | NIST | |
| 426.19 nm | 해당 없음 | F V | emission | 2s.2p.(3P*).3p 2D → 2s.2p.(3P*).3d 2D* | 측정값 | NIST | |
| 426.28 nm | 해당 없음 | F VI | emission | 1s2.2s.3s 1S → 1s2.2s.3p 1P* | 측정값 | NIST | |
| 427.32 nm | 해당 없음 | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | 측정값 | NIST | |
| 427.94 nm | 해당 없음 | F V | emission | 2s.2p.(3P*).3p 2D → 2s.2p.(3P*).3d 2D* | 측정값 | NIST | |
| 429.9165 nm | 200 | F II | emission | 2s2.2p3.(2D*).3s 1D* → 2s2.2p3.(2D*).3p 1F | 측정값 | NIST | |
| 432.27 nm | 해당 없음 | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | 측정값 | NIST | |
| 433.94 nm | 해당 없음 | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | 측정값 | NIST | |
| 435.28 nm | 해당 없음 | F V | emission | 2s.2p.(3P*).3p 2D → 2s.2p.(3P*).3d 2D* | 측정값 | NIST | |
| 437.11 nm | 해당 없음 | F V | emission | 2s.2p.(3P*).3p 2D → 2s.2p.(3P*).3d 2D* | 측정값 | NIST | |
| 439.05 nm | 해당 없음 | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | 측정값 | NIST | |
| 444.6527 nm | 160 | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | 측정값 | NIST | |
| 444.6689 nm | 해당 없음 | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | 측정값 | NIST | |
| 444.6721 nm | 170 | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | 측정값 | NIST | |
| 444.7117 nm | 해당 없음 | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | 측정값 | NIST | |
| 444.7148 nm | 해당 없음 | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | 측정값 | NIST | |
| 444.7188 nm | 180 | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | 측정값 | NIST | |
| 455.99 nm | 해당 없음 | F VI | emission | 1s2.2p.3p 1D → 1s2.2p.3d 1F* | 측정값 | NIST | |
| 456.45 nm | 해당 없음 | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | 측정값 | NIST | |
| 457.45 nm | 해당 없음 | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | 측정값 | NIST | |
| 457.96 nm | 해당 없음 | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | 측정값 | NIST | |
| 459.81 nm | 해당 없음 | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | 측정값 | NIST | |
| 460.57 nm | 해당 없음 | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | 측정값 | NIST | |
| 461.08 nm | 해당 없음 | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | 측정값 | NIST | |
| 463.41 nm | 해당 없음 | F VI | emission | 1s2.2p.4p 1P → 1s2.2p.4d 1P* | 측정값 | NIST | |
| 478.945 nm | 해당 없음 | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | 측정값 | NIST | |
| 478.945 nm | 해당 없음 | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | 측정값 | NIST | |
| 486.899 nm | 해당 없음 | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | 측정값 | NIST | |
| 486.899 nm | 해당 없음 | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | 측정값 | NIST | |
| 490.456 nm | 해당 없음 | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | 측정값 | NIST | |
| 507.4 nm | 해당 없음 | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | 측정값 | NIST | |
| 507.86 nm | 해당 없음 | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | 측정값 | NIST | |
| 509.78 nm | 해당 없음 | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | 측정값 | NIST | |
| 510.25 nm | 해당 없음 | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | 측정값 | NIST | |
| 511.78 nm | 해당 없음 | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | 측정값 | NIST | |
| 515.72 nm | 해당 없음 | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | 측정값 | NIST | |
| 517.29 nm | 해당 없음 | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | 측정값 | NIST | |
| 517.4 nm | 해당 없음 | F VIII | emission | 1s.3s 3S → 1s.3p 3P* | 측정값 | NIST | |
| 522.95 nm | 해당 없음 | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | 측정값 | NIST | |
| 525.1 nm | 해당 없음 | F VIII | emission | 1s.3s 3S → 1s.3p 3P* | 측정값 | NIST | |
| 528.03 nm | 해당 없음 | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2D | 측정값 | NIST | |
| 528.03 nm | 해당 없음 | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2D | 측정값 | NIST | |
| 528.03 nm | 해당 없음 | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2D | 측정값 | NIST | |
| 528.03 nm | 해당 없음 | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2D | 측정값 | NIST | |
| 533.07 nm | 해당 없음 | F VI | emission | 1s2.2p.3p 1S → 1s2.2p.3d 1P* | 측정값 | NIST | |
| 543.21 nm | 해당 없음 | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | 측정값 | NIST | |
| 544 nm | 해당 없음 | F VII | emission | 1s2.8p 2P* → 1s2.9d 2D | 측정값 | NIST | |
| 544 nm | 해당 없음 | F VII | emission | 1s2.8p 2P* → 1s2.9d 2D | 측정값 | NIST | |
| 544 nm | 해당 없음 | F VII | emission | 1s2.8p 2P* → 1s2.9d 2D | 측정값 | NIST | |
| 545.91 nm | 해당 없음 | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | 측정값 | NIST | |
| 549.84 nm | 해당 없음 | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | 측정값 | NIST | |
| 549.99 nm | 해당 없음 | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | 측정값 | NIST | |
| 556.76 nm | 해당 없음 | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | 측정값 | NIST | |
| 560.85 nm | 해당 없음 | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | 측정값 | NIST | |
| 568.67 nm | 해당 없음 | F V | emission | 2s.2p.(3P*).3s 2P* → 2s.2p.(3P*).3p 2P | 측정값 | NIST | |
| 572.12 nm | 해당 없음 | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | 측정값 | NIST | |
| 572.12 nm | 해당 없음 | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | 측정값 | NIST | |
| 572.15 nm | 해당 없음 | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | 측정값 | NIST | |
| 573.29 nm | 해당 없음 | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | 측정값 | NIST | |
| 573.29 nm | 해당 없음 | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | 측정값 | NIST | |
| 573.32 nm | 해당 없음 | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | 측정값 | NIST | |
| 573.32 nm | 해당 없음 | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | 측정값 | NIST | |
| 576.14 nm | 해당 없음 | F V | emission | 2s.2p.(3P*).3s 2P* → 2s.2p.(3P*).3p 2P | 측정값 | NIST | |
| 585.63 nm | 해당 없음 | F V | emission | 2s.2p.(3P*).3s 2P* → 2s.2p.(3P*).3p 2P | 측정값 | NIST | |
| 593.55 nm | 해당 없음 | F V | emission | 2s.2p.(3P*).3s 2P* → 2s.2p.(3P*).3p 2P | 측정값 | NIST | |
| 604 nm | 해당 없음 | F VII | emission | 1s2.8d 2D → 1s2.9p 2P* | 측정값 | NIST | |
| 604 nm | 해당 없음 | F VII | emission | 1s2.8d 2D → 1s2.9p 2P* | 측정값 | NIST | |
| 604 nm | 해당 없음 | F VII | emission | 1s2.8d 2D → 1s2.9p 2P* | 측정값 | NIST | |
| 683 nm | 해당 없음 | F VII | emission | 1s2.9p 2P* → 1s2.10d 2D | 측정값 | NIST | |
| 683 nm | 해당 없음 | F VII | emission | 1s2.9p 2P* → 1s2.10d 2D | 측정값 | NIST | |
| 683 nm | 해당 없음 | F VII | emission | 1s2.9p 2P* → 1s2.10d 2D | 측정값 | NIST | |
| 713.8 nm | 해당 없음 | F V | emission | 2s.2p.(3P*).4p 2D → 2s.2p.(3P*).4d 2F* | 측정값 | NIST | |
| 719.4 nm | 해당 없음 | F V | emission | 2s.2p.(3P*).4p 2D → 2s.2p.(3P*).4d 2F* | 측정값 | NIST | |
| 723.4 nm | 해당 없음 | F VI | emission | 1s2.2p.4s 1P* → 1s2.2p.4p 1D | 측정값 | NIST | |
| 728.5 nm | 해당 없음 | F VIII | emission | 1s.3s 1S → 1s.3p 1P* | 측정값 | NIST | |
| 735.8 nm | 해당 없음 | F V | emission | 2s.2p.(3P*).4p 2D → 2s.2p.(3P*).4d 2F* | 측정값 | NIST |
확장 특성
공유 결합 반지름(확장)
- 공유 결합 반지름(Pyykkö)
- 64 pm
- 공유 결합 반지름(Pyykkö, 이중 결합)
- 59 pm
- 공유 결합 반지름(Pyykkö, 삼중 결합)
- 53 pm
- 공유 결합 반지름(Bragg)
- 67 pm
반데르발스 반지름
- Bondi
- 147 pm
- Batsanov
- 150 pm
- Alvarez
- 146 pm
- UFF
- 336.4 pm
- MM3
- 171 pm
- Dreiding
- 347.2 pm
- Rowland–Taylor
- 146 pm
원자 및 금속 반지름
- 원자 반지름(Rahm)
- 163 pm
번호 척도
- Mendeleev
- 106
- Pettifor
- 102
- Glawe
- 102
전기 음성도 척도
- Ghosh
- 0
- Gunnarsson–Lundqvist
- 11
- Robles–Bartolotti
- 10
분극률 및 분산
- 쌍극자 분극률
- 3.74 a.u.
- 쌍극자 분극률(불확도)
- 0.08 a.u.
- C₆
- 9.52 Ha·Bohr6
- C₆ (Gould–Bučko)
- 10.2 Ha·Bohr6
화학 친화력
- 양성자 친화도
- 340.1 kJ/mol
- 기체상 염기성
- 315.1 kJ/mol
공급 위험 및 경제성
- 생산 집중도
- 56
- 상대적 공급 위험
- 7
- 매장량 분포
- 17
- 정치적 안정성(최대 생산국)
- 24
- 정치적 안정성(최대 매장국)
- 44
상전이 및 동소체
| 녹는점 | 53.48 K |
| 끓는점 | 85.04 K |
| 임계점(온도) | 144.41 K |
| 임계점(압력) | 5.17 MPa |
| 삼중점(온도) | 53.48 K |
| 삼중점(압력) | 90 kPa |
산화 상태 분류
심화 참고 데이터
차폐 상수 (3)
| n | 오비탈 | σ |
|---|---|---|
| 1 | s | 0.3499 |
| 2 | p | 3.9 |
| 2 | s | 3.8724 |
결정 반지름 상세 정보 (5)
| 전하 | CN | 스핀 | rcrystal (pm) | 기원 |
|---|---|---|---|---|
| -1 | II | 114.5 | ||
| -1 | III | 116 | ||
| -1 | IV | 117 | ||
| -1 | VI | 119 | ||
| 7 | VI | 22 | Ahrens (1952) ionic radius, |
동위원소 붕괴 방식 (31)
| 동위원소 | 모드 | 세기 |
|---|---|---|
| 13 | p | — |
| 14 | p | — |
| 15 | p | 100% |
| 16 | p | 100% |
| 17 | B+ | 100% |
| 18 | B+ | 100% |
| 20 | B- | 100% |
| 21 | B- | 100% |
| 22 | B- | 100% |
| 22 | B-n | 11% |
X선 산란 인자 (502)
| 에너지 (eV) | f₁ | f₂ |
|---|---|---|
| 10 | — | 0.05165 |
| 10.1617 | — | 0.05648 |
| 10.3261 | — | 0.06176 |
| 10.4931 | — | 0.06754 |
| 10.6628 | — | 0.07386 |
| 10.8353 | — | 0.08077 |
| 11.0106 | — | 0.08833 |
| 11.1886 | — | 0.09659 |
| 11.3696 | — | 0.10831 |
| 11.5535 | — | 0.12462 |
추가 데이터
Estimated Crustal Abundance
The estimated element abundance in the earth's crust.
5.85×102 milligrams per kilogram
참고 문헌 (1)
- [5] Fluorine https://education.jlab.org/itselemental/ele009.html
Estimated Oceanic Abundance
The estimated element abundance in the earth's oceans.
1.3 milligrams per liter
참고 문헌 (1)
- [5] Fluorine https://education.jlab.org/itselemental/ele009.html
참고 문헌
(9)
Data deposited in or computed by PubChem
The half-life and atomic mass data was provided by the Atomic Mass Data Center at the International Atomic Energy Agency.
Element data are cited from the Atomic weights of the elements (an IUPAC Technical Report). The IUPAC periodic table of elements can be found at https://iupac.org/what-we-do/periodic-table-of-elements/. Additional information can be found within IUPAC publication doi:10.1515/pac-2015-0703 Copyright © 2020 International Union of Pure and Applied Chemistry.
The information are cited from Pure Appl. Chem. 2018; 90(12): 1833-2092, https://doi.org/10.1515/pac-2015-0703.
Thomas Jefferson National Accelerator Facility (Jefferson Lab) is one of 17 national laboratories funded by the U.S. Department of Energy. The lab's primary mission is to conduct basic research of the atom's nucleus using the lab's unique particle accelerator, known as the Continuous Electron Beam Accelerator Facility (CEBAF). For more information visit https://www.jlab.org/
The periodic table at the LANL (Los Alamos National Laboratory) contains basic element information together with the history, source, properties, use, handling and more. The provenance data may be found from the link under the source name.
The periodic table contains NIST's critically-evaluated data on atomic properties of the elements. The provenance data that include data for atomic spectroscopy, X-ray and gamma ray, radiation dosimetry, nuclear physics, and condensed matter physics may be found from the link under the source name. Ref: https://www.nist.gov/pml/atomic-spectra-database
This section provides all form of data related to element Fluorine.
The element property data was retrieved from publications.