Fluorine (F)
halogenGas
मानक परमाणु भार
18.998403 uइलेक्ट्रॉन विन्यास
[He] 2s2 2p5गलनांक
-219.62 °Cक्वथनांक
-188.12 °Cघनत्व
1.696 kg/m³ऑक्सीकरण अवस्थाएँ
-1विद्युतऋणात्मकता (पॉलिंग)
3.98आयनन ऊर्जा (प्रथम)
17.42282 eVखोज का वर्ष
1886परमाणु त्रिज्या
50 pmविवरण
Fluorine is the lightest halogen and the most electronegative chemical element. In elemental form it occurs as diatomic fluorine, F₂, a highly reactive oxidizing gas. Natural fluorine is almost entirely the stable isotope ¹⁹F and is found in minerals rather than as the free element. Its chemistry underlies fluoride minerals, uranium enrichment chemistry, fluoropolymers, refrigerants, many agrochemicals, and a large share of modern medicinal chemistry.
Fluorine is the most electronegative and reactive of all elements. It is a pale yellow, corrosive gas, which reacts with most organic and inorganic substances. Finely divided metals, glass, ceramics, carbon, and even water burn in fluorine with a bright flame.
Until World War II, there was no commercial production of elemental fluorine. The nuclear bomb project and nuclear energy applications, however, made it necessary to produce large quantities.
The name derives from the Latin fluere for "flow" or "flux" because fluorite (CaF2) was used as a flux in metallurgy owing to its low melting point. It was discovered in hydrofluoric acid by the Swedish pharmacist and chemist Carl-Wilhelm Scheele in 1771, but it was not isolated until 1886 by the French pharmacist and chemist Henri Moissan.
Fluorine is the most reactive of all elements and no chemical substance is capable of freeing fluorine from any of its compounds. For this reason, fluorine does not occur free in nature and was extremely difficult for scientists to isolate. The first recorded use of a fluorine compound dates to around 1670 to a set of instructions for etching glass that called for Bohemian emerald (CaF2). Chemists attempted to identify the material that was capable of etching glass and George Gore was able to produce a small amount of fluorine through an electrolytic process in 1869. Unknown to Gore, fluorine gas explosively combines with hydrogen gas. That is exactly what happened in Gore's experiment when the fluorine gas that formed on one electrode combined with the hydrogen gas that formed on the other electrode. Ferdinand Frederic Henri Moissan, a French chemist, was the first to successfully isolate fluorine in 1886. He did this through the electrolysis of potassium fluoride (KF) and hydrofluoric acid (HF). He also completely isolated the fluorine gas from the hydrogen gas and he built his electrolysis device completely from platinum. His work was so impressive that he was awarded the Nobel Prize for chemistry in 1906. Today, fluorine is still produced through the electrolysis of potassium fluoride and hydrofluoric acid as well as through the electrolysis of molten potassium acid fluoride (KHF2).
From the Latin and French fluere: flow or flux. In 1529, Georigius Agricola described the use of fluorspar as a flux, and as early as 1670 Schwandhard found that glass was etched when exposed to fluorspar treated with acid. Scheele and many later investigators, including Davy, Gay-Lussac, Lavoisier, and Thenard, experimented with hydrofluoric acid, some experiments ending tragically.
The element was finally isolated in 1866 by Moissan after nearly 74 years of continuous effort.
Pure fluorine, F₂, is a pale yellow gas at ordinary temperature and pressure. It condenses to a yellow liquid and freezes to a pale solid at low temperature. The gas has a sharp, irritating odor, but odor is not a safe means of detection.
Elemental fluorine, F₂, is used mainly where its extreme oxidizing and fluorinating power is required, including preparation of uranium hexafluoride, UF₆, for isotope separation and manufacture of some specialty inorganic fluorides. Much larger practical importance lies in fluorine-containing compounds. Fluoropolymers such as polytetrafluoroethylene, (C₂F₄)ₙ, are used for chemically resistant coatings, seals, membranes, and electrical insulation. Fluoride compounds are used in glass etching, aluminum production, dental products, pharmaceuticals, and crop-protection chemicals.
Fluorine is added to city water supplies in the proportion of about one part per million to help prevent tooth decay. Sodium fluoride (NaF), stannous(II) fluoride (SnF2) and sodium monofluorophosphate (Na2PO3F) are all fluorine compounds added to toothpaste, also to help prevent tooth decay. Hydrofluoric acid (HF) is used to etch glass, including most of the glass used in light bulbs. Uranium hexafluoride (UF6) is used to separate isotopes of uranium. Crystals of calcium fluoride (CaF2), also known as fluorite and fluorspar, are used to make lenses to focus infrared light. Fluorine joins with carbon to form a class of compounds known as fluorocarbons. Some of these compounds, such as dichlorodifluoromethane (CF2Cl2), were widely used in air conditioning and refrigeration systems and in aerosol spray cans, but have been phased out due to the damage they were causing to the earth's ozone layer.
Fluorine and its compounds are used in producing uranium (from the hexafluoride) and more than 100 commercial fluorochemicals, including many high-temperature plastics. Hydrofluoric acid etches glass of light bulbs. Fluorochlorohydrocarbons are extensively used in air conditioning and refrigeration.
The presence of fluorine as a soluble fluoride in drinking water to the extent of 2 ppm may cause mottled enamel in teeth when used by children acquiring permanent teeth; in smaller amounts, however, fluoride helps prevent dental cavities.
Elemental fluorine has been studied as a rocket propellant as it has an exceptionally high specific impulse value.
Isotopes in Medicine
18F is a radioactive fluorine isotope that is used in an 18F-FDG compound (18F-labeled, fluoro-deoxy glucose) for imaging the organs, bones, tissues, and brain of the body with a technique called positron emission topography (PET). The 18F-FDG compound is injected and the isotopically labeled glucose is consumed by any cell requiring glucose as a source of energy [98] R. Krebs. The History And Use Of Our Earth’s Chemical Elements: A Reference Guide, 2nd ed. Greenwood Press, Westport, CT (2006)., [99] World Nuclear Association. Radioisotopes in Medicine, World Nuclear Association (2014), Feb. 23; http://www.world-nuclear.org/info/inf55.html..
– 18F emits positrons that collect in tissue and interact with regular negative electrons when injected into the body. The positrons and electrons annihilate each other, producing two gamma rays that are emitted in opposite directions. The radiation is detected on a PET camera, which generates a picture of the body part being examined (Fig. IUPAC.9.1).
–Because 18F has a short half-life of about 110 min, there is little chance of radiation damage to the patient.
Fluorine most commonly has oxidation state −1 in compounds, as in hydrogen fluoride, HF, sodium fluoride, NaF, and calcium fluoride, CaF₂. With highly electropositive elements it forms ionic fluorides; with nonmetals it forms strongly covalent fluorides such as sulfur hexafluoride, SF₆, and silicon tetrafluoride, SiF₄. Fluorine can also form interhalogen compounds, including chlorine trifluoride, ClF₃. Oxygen fluorides such as oxygen difluoride, OF₂, are unusual because fluorine is assigned the negative oxidation state while oxygen is positive.
One hypothesis says that fluorine can be substituted for hydrogen wherever it occurs in organic compounds, which could lead to an astronomical number of new fluorine compounds. Compounds of fluorine with rare gases have now been confirmed in fluorides of xenon, radon, and krypton.
See more information at the Fluorine compound page.
Elemental fluorine, F₂, is acutely toxic, corrosive, and a powerful oxidizer that can ignite or violently react with many materials. Hydrogen fluoride, HF, is especially hazardous because it penetrates tissue and binds calcium and magnesium ions. Soluble fluorides can be toxic at sufficient dose, while controlled low concentrations of fluoride ion, F⁻, have dental uses. Some fluorinated gases are chemically stable but may be asphyxiants or potent greenhouse gases.
Elemental fluorine and the fluoride ion are highly toxic. The free element has a characteristic pungent odor, detectable in concentrations as low as 20 ppb, which is below the safe working level. The recommended maximum allowable concentration for a daily 8-hour time-weighted exposure is 1 ppm.
Fluorine enters the environment chiefly as fluoride in minerals, volcanic emissions, sea spray, industrial releases, and weathering products. Fluoride ion, F⁻, binds to calcium, aluminum, and iron phases and can be immobilized in soils or sediments, though mobility depends strongly on pH and water chemistry. Elevated natural or industrial fluoride in groundwater can affect teeth, bones, livestock, and vegetation. Persistent organofluorine compounds vary widely in mobility and degradation behavior.
Fluorine supply is based primarily on mining fluorite, CaF₂, with smaller contributions from fluorapatite-bearing phosphate rock processed in fertilizer production. Hydrogen fluoride, HF, is the central industrial intermediate, made by treating fluorite with sulfuric acid, H₂SO₄. Direct production and transport of elemental fluorine are limited by its reactivity, so it is commonly generated or consumed close to the point of use. Demand is tied to aluminum smelting, chemical manufacturing, electronics materials, fluoropolymers, and regulated refrigerant transitions. Recycling is important for some fluorinated materials but is often chemically or economically difficult.
Found in the minerals fluorite (CaF2) and cryolite(Na3AlF6). Electrolysis of hydrofluoric acid (HF) or potassium acid fluoride (KHF2) is the only practical method of commercial production.
Fluorine is relatively rare in the cosmos compared with neighboring light elements. It is thought to be made in several settings, including helium-burning regions of evolved stars, neutrino-driven processes in core-collapse supernovae, and possibly novae, with their relative contributions still studied. In planetary materials it is concentrated into minerals, melts, and volatile-bearing phases rather than remaining as free F₂.
- Fluorine has only one stable natural isotope, ¹⁹F.
- Fluorite, CaF₂, gave the element its name through its use as a flux.
- Glass etching by hydrogen fluoride, HF, reflects the strength of silicon-fluorine bonding.
- Polytetrafluoroethylene, (C₂F₄)ₙ, was discovered accidentally during refrigerant research.
- Uranium hexafluoride, UF₆, is volatile enough for gas-phase isotope enrichment.
- Fluoride minerals can preserve fluorine in rocks over geologic time.
चित्र
गुण
भौतिक
- परमाणु त्रिज्या (आनुभविक)
- 50 pm सभी तत्वों की परमाणु त्रिज्या (आनुभविक) की तुलना करें →
- सहसंयोजक त्रिज्या
- 57 pm सभी तत्वों की सहसंयोजक त्रिज्या की तुलना करें →
- वान डर वाल्स त्रिज्या
- 135 pm सभी तत्वों की वान डर वाल्स त्रिज्या की तुलना करें →
- घनत्व
- 1.696 kg/m³ सभी तत्वों की घनत्व की तुलना करें →
- मोलर आयतन
- 0.0171 L/mol
- STP पर प्रावस्था
- गैस सभी तत्वों की STP पर प्रावस्था की तुलना करें →
- गलनांक
- -219.62 °C सभी तत्वों की गलनांक की तुलना करें →
- क्वथनांक
- -188.12 °C सभी तत्वों की क्वथनांक की तुलना करें →
- तापीय चालकता
- 0.028 W/(m·K) सभी तत्वों की तापीय चालकता की तुलना करें →
- विशिष्ट ऊष्मा धारिता
- 0.824 J/(g·K) सभी तत्वों की विशिष्ट ऊष्मा धारिता की तुलना करें →
- मोलर ऊष्मा धारिता
- 31.304 J/(mol·K) सभी तत्वों की मोलर ऊष्मा धारिता की तुलना करें →
- क्रिस्टल संरचना
- एकनताक्ष सभी तत्वों की क्रिस्टल संरचना की तुलना करें →
रासायनिक
- विद्युतऋणात्मकता (पॉलिंग)
- 3.98 सभी तत्वों की विद्युतऋणात्मकता (पॉलिंग) की तुलना करें →
- विद्युतऋणात्मकता (ऐलन)
- 4.193
- इलेक्ट्रॉन बंधुता
- 3.4011 eV
- आयनन ऊर्जा (प्रथम)
- 17.42282 eV सभी तत्वों की आयनन ऊर्जा (प्रथम) की तुलना करें →
- आयनन ऊर्जा (द्वितीय)
- 34.97093 eV सभी तत्वों की आयनन ऊर्जा (द्वितीय) की तुलना करें →
- आयनन ऊर्जा (तृतीय)
- 62.708196 eV सभी तत्वों की आयनन ऊर्जा (तृतीय) की तुलना करें →
- आयनन ऊर्जा (चतुर्थ)
- 87.1753 eV सभी तत्वों की आयनन ऊर्जा (चतुर्थ) की तुलना करें →
- आयनन ऊर्जा (पंचम)
- 114.249393 eV सभी तत्वों की आयनन ऊर्जा (पंचम) की तुलना करें →
- ऑक्सीकरण अवस्थाएँ
- -1 सभी तत्वों की ऑक्सीकरण अवस्थाएँ की तुलना करें →
- संयोजकता इलेक्ट्रॉन
- 7 सभी तत्वों की संयोजकता इलेक्ट्रॉन की तुलना करें →
- इलेक्ट्रॉन विन्यास
- [He] 2s2 2p5
ऊष्मागतिक
- त्रिक बिंदु (तापमान)
- -219.67 °C
- त्रिक बिंदु (दाब)
- 9e+4 Pa
- क्रांतिक बिंदु (तापमान)
- -128.74 °C
- क्रांतिक बिंदु (दाब)
- 5.1724e+6 Pa
- गलन ऊष्मा
- 0.0026429 eV सभी तत्वों की गलन ऊष्मा की तुलना करें →
- वाष्पन ऊष्मा
- 0.06778256 eV सभी तत्वों की वाष्पन ऊष्मा की तुलना करें →
- परमाणुकरण ऊष्मा
- 0.8228222 eV
- परमाणुकरण एन्थैल्पी
- 0.82225216 eV
नाभिकीय
- प्रोटॉन
- 9 सभी तत्वों की प्रोटॉन की तुलना करें →
- न्यूट्रॉन
- 10 सभी तत्वों की न्यूट्रॉन की तुलना करें →
- ज्ञात समस्थानिक
- 19 सभी तत्वों की ज्ञात समस्थानिक की तुलना करें →
- स्थिर समस्थानिक
- 1 सभी तत्वों की स्थिर समस्थानिक की तुलना करें →
- सबसे स्थिर समस्थानिक
- F-19
- खोज का वर्ष
- 1886
प्रचुरता
- प्रचुरता (भूपर्पटी)
- 585 mg/kg सभी तत्वों की प्रचुरता (भूपर्पटी) की तुलना करें →
- प्रचुरता (महासागर)
- 1.3 mg/L सभी तत्वों की प्रचुरता (महासागर) की तुलना करें →
क्रिस्टल संरचना
उपलब्ध नहीं
इलेक्ट्रॉनिक संरचना
- प्रति कोश इलेक्ट्रॉन
- 2, 7 सभी तत्वों की प्रति कोश इलेक्ट्रॉन की तुलना करें →
पहचानकर्ता
- CAS संख्या
- 7782-41-4 सभी तत्वों की CAS संख्या की तुलना करें →
- टर्म प्रतीक
- 2P°3/2
- InChI
- InChI=1S/F
- InChI कुंजी
- YCKRFDGAMUMZLT-UHFFFAOYSA-N
इलेक्ट्रॉन विन्यास मापित
F: 2s² 2p⁵[He] 2s² 2p⁵1s² 2s² 2p⁵परमाणु मॉडल
समस्थानिक न्यूट्रॉन की संख्या, द्रव्यमान और स्थिरता बदलते हैं — उदासीन परमाणु का इलेक्ट्रॉन विन्यास नहीं।
सांकेतिक परमाणु मॉडल, वास्तविक अनुपात में नहीं।
परमाणु पहचान-चिह्न
उत्सर्जन / अवशोषण स्पेक्ट्रम
समस्थानिक वितरण
| द्रव्यमान संख्या | परमाणु द्रव्यमान (u) | प्राकृतिक प्रचुरता | अर्धायु |
|---|---|---|---|
| 19 स्थिर | 18.99840316273 ± 0.00000000092 | 100.0000% | स्थिर |
प्रावस्था / अवस्था
कारण: क्वथनांक (-188.12 °C) से 213.1 °C अधिक
सांकेतिक, वास्तविक अनुपात में नहीं
प्रावस्था संक्रमण बिंदु
संक्रमण ऊर्जाएँ
गलनांक पर 1 mol को पिघलाने के लिए आवश्यक ऊर्जा
क्वथनांक पर 1 mol को वाष्पित करने के लिए आवश्यक ऊर्जा
घनत्व
मानक परिस्थितियों में
वर्तमान T पर आदर्श गैस नियम से अनुमानित
उन्नत
परमाणु स्पेक्ट्रम
उपलब्ध स्पेक्ट्रमी रेखा डेटा ?
| आयन | आवेश | कुल रेखाएँ | संक्रमण प्रायिकताएँ | स्तर पदनाम |
|---|---|---|---|---|
| F I | 0 | 162 | 120 | 162 |
| F II | +1 | 150 | 67 | 67 |
| F III | +2 | 141 | 34 | 34 |
| F IV | +3 | 75 | 30 | 30 |
| F V | +4 | 513 | 472 | 472 |
| F VI | +5 | 269 | 269 | 269 |
| F VII | +6 | 470 | 439 | 470 |
| F VIII | +7 | 128 | 128 | 128 |
| F IX | +8 | 137 | 137 | 137 |
उपलब्ध ऊर्जा स्तर डेटा ?
| आयन | आवेश | स्तर |
|---|---|---|
| F I | 0 | 303 |
| F II | +1 | 291 |
| F III | +2 | 278 |
| F IV | +3 | 170 |
| F V | +4 | 138 |
| F VI | +5 | 100 |
| F VII | +6 | 77 |
| F VIII | +7 | 151 |
| F IX | +8 | 149 |
आयनिक त्रिज्याएँ
| आवेश | उपसहसंयोजन | प्रचक्रण | त्रिज्या |
|---|---|---|---|
| -1 | 2 | उपलब्ध नहीं | 128.5 pm |
| -1 | 3 | उपलब्ध नहीं | 130 pm |
| -1 | 4 | उपलब्ध नहीं | 131 pm |
| -1 | 6 | उपलब्ध नहीं | 133 pm |
| +7 | 6 | उपलब्ध नहीं | 8 pm |
यौगिक
समस्थानिक (1)
| द्रव्यमान संख्या | परमाणु द्रव्यमान (u) | प्राकृतिक प्रचुरता | अर्धायु | क्षय का प्रकार | |
|---|---|---|---|---|---|
| 19 स्थिर | 18.99840316273 ± 0.00000000092 | 100.0000% | स्थिर | stable |
स्पेक्ट्रमी रेखाएँ
| तरंगदैर्घ्य (nm) | तीव्रता | आयनन अवस्था | प्रकार | संक्रमण | सटीकता | स्रोत | |
|---|---|---|---|---|---|---|---|
| 383.22 nm | उपलब्ध नहीं | F V | emission | 2s.2p.(3P*).4d 2F* → 2p2.(1D).3d 2D | मापित | NIST | |
| 384.7086 nm | 270 | F II | emission | 2s2.2p3.(4S*).3s 5S* → 2s2.2p3.(4S*).3p 5P | मापित | NIST | |
| 384.9985 nm | 260 | F II | emission | 2s2.2p3.(4S*).3s 5S* → 2s2.2p3.(4S*).3p 5P | मापित | NIST | |
| 385.1668 nm | 250 | F II | emission | 2s2.2p3.(4S*).3s 5S* → 2s2.2p3.(4S*).3p 5P | मापित | NIST | |
| 385.69 nm | उपलब्ध नहीं | F VI | emission | 1s2.2s.3s 1S → 1s2.2s.3p 3P* | मापित | NIST | |
| 385.712 nm | उपलब्ध नहीं | F V | emission | 2p2.(3P).3p 4S* → 2p2.(3P).3d 4P | मापित | NIST | |
| 387.086 nm | उपलब्ध नहीं | F V | emission | 2p2.(3P).3p 4S* → 2p2.(3P).3d 4P | मापित | NIST | |
| 388.508 nm | उपलब्ध नहीं | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | मापित | NIST | |
| 388.6 nm | उपलब्ध नहीं | F VII | emission | 1s2.7f 2F* → 1s2.8g 2G | मापित | NIST | |
| 388.6 nm | उपलब्ध नहीं | F VII | emission | 1s2.7f 2F* → 1s2.8g 2G | मापित | NIST | |
| 388.6 nm | उपलब्ध नहीं | F VII | emission | 1s2.7f 2F* → 1s2.8g 2G | मापित | NIST | |
| 389.2 nm | उपलब्ध नहीं | F VII | emission | 1s2.7f 2F* → 1s2.8d 2D | मापित | NIST | |
| 389.2 nm | उपलब्ध नहीं | F VII | emission | 1s2.7f 2F* → 1s2.8d 2D | मापित | NIST | |
| 389.2 nm | उपलब्ध नहीं | F VII | emission | 1s2.7f 2F* → 1s2.8d 2D | मापित | NIST | |
| 390.229 nm | उपलब्ध नहीं | F V | emission | 2p2.(3P).3p 4S* → 2p2.(3P).3d 4P | मापित | NIST | |
| 390.45 nm | उपलब्ध नहीं | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | मापित | NIST | |
| 394.51 nm | उपलब्ध नहीं | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2F | मापित | NIST | |
| 394.51 nm | उपलब्ध नहीं | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2F | मापित | NIST | |
| 394.51 nm | उपलब्ध नहीं | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2F | मापित | NIST | |
| 394.518 nm | उपलब्ध नहीं | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | मापित | NIST | |
| 394.736 nm | उपलब्ध नहीं | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | मापित | NIST | |
| 396.08 nm | उपलब्ध नहीं | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | मापित | NIST | |
| 396.113 nm | उपलब्ध नहीं | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | मापित | NIST | |
| 399.6 nm | उपलब्ध नहीं | F VII | emission | 1s2.7d 2D → 1s2.8p 2P* | मापित | NIST | |
| 399.6 nm | उपलब्ध नहीं | F VII | emission | 1s2.7d 2D → 1s2.8p 2P* | मापित | NIST | |
| 399.6 nm | उपलब्ध नहीं | F VII | emission | 1s2.7d 2D → 1s2.8p 2P* | मापित | NIST | |
| 399.692 nm | उपलब्ध नहीं | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | मापित | NIST | |
| 399.692 nm | उपलब्ध नहीं | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | मापित | NIST | |
| 400.26 nm | उपलब्ध नहीं | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | मापित | NIST | |
| 400.942 nm | उपलब्ध नहीं | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | मापित | NIST | |
| 402.4726 nm | 240 | F II | emission | 2s2.2p3.(4S*).3s 3S* → 2s2.2p3.(4S*).3p 3P | मापित | NIST | |
| 402.501 nm | 220 | F II | emission | 2s2.2p3.(4S*).3s 3S* → 2s2.2p3.(4S*).3p 3P | मापित | NIST | |
| 402.5491 nm | 230 | F II | emission | 2s2.2p3.(4S*).3s 3S* → 2s2.2p3.(4S*).3p 3P | मापित | NIST | |
| 405.99 nm | उपलब्ध नहीं | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | मापित | NIST | |
| 405.99 nm | उपलब्ध नहीं | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | मापित | NIST | |
| 410.3075 nm | 190 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | मापित | NIST | |
| 410.3213 nm | 170 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | मापित | NIST | |
| 410.3506 nm | 200 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | मापित | NIST | |
| 410.3713 nm | 180 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | मापित | NIST | |
| 410.387 nm | 170 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | मापित | NIST | |
| 410.4008 nm | उपलब्ध नहीं | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | मापित | NIST | |
| 410.916 nm | 170 | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | मापित | NIST | |
| 411.03 nm | उपलब्ध नहीं | F VI | emission | 1s2.2s.3p 1P* → 1s2.2s.3d 3D | मापित | NIST | |
| 411.272 nm | उपलब्ध नहीं | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | मापित | NIST | |
| 411.2969 nm | उपलब्ध नहीं | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | मापित | NIST | |
| 411.44 nm | उपलब्ध नहीं | F VI | emission | 1s2.2s.3p 1P* → 1s2.2s.3d 3D | मापित | NIST | |
| 411.6535 nm | 160 | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | मापित | NIST | |
| 411.699 nm | उपलब्ध नहीं | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | मापित | NIST | |
| 411.8752 nm | उपलब्ध नहीं | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | मापित | NIST | |
| 411.9207 nm | 150 | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | मापित | NIST | |
| 415.775 nm | उपलब्ध नहीं | F II | emission | 2s2.2p4 1D → 2s2.2p4 1S | मापित | NIST | |
| 423.3 nm | उपलब्ध नहीं | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | मापित | NIST | |
| 424.76 nm | उपलब्ध नहीं | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | मापित | NIST | |
| 426.19 nm | उपलब्ध नहीं | F V | emission | 2s.2p.(3P*).3p 2D → 2s.2p.(3P*).3d 2D* | मापित | NIST | |
| 426.28 nm | उपलब्ध नहीं | F VI | emission | 1s2.2s.3s 1S → 1s2.2s.3p 1P* | मापित | NIST | |
| 427.32 nm | उपलब्ध नहीं | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | मापित | NIST | |
| 427.94 nm | उपलब्ध नहीं | F V | emission | 2s.2p.(3P*).3p 2D → 2s.2p.(3P*).3d 2D* | मापित | NIST | |
| 429.9165 nm | 200 | F II | emission | 2s2.2p3.(2D*).3s 1D* → 2s2.2p3.(2D*).3p 1F | मापित | NIST | |
| 432.27 nm | उपलब्ध नहीं | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | मापित | NIST | |
| 433.94 nm | उपलब्ध नहीं | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | मापित | NIST | |
| 435.28 nm | उपलब्ध नहीं | F V | emission | 2s.2p.(3P*).3p 2D → 2s.2p.(3P*).3d 2D* | मापित | NIST | |
| 437.11 nm | उपलब्ध नहीं | F V | emission | 2s.2p.(3P*).3p 2D → 2s.2p.(3P*).3d 2D* | मापित | NIST | |
| 439.05 nm | उपलब्ध नहीं | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | मापित | NIST | |
| 444.6527 nm | 160 | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | मापित | NIST | |
| 444.6689 nm | उपलब्ध नहीं | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | मापित | NIST | |
| 444.6721 nm | 170 | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | मापित | NIST | |
| 444.7117 nm | उपलब्ध नहीं | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | मापित | NIST | |
| 444.7148 nm | उपलब्ध नहीं | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | मापित | NIST | |
| 444.7188 nm | 180 | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | मापित | NIST | |
| 455.99 nm | उपलब्ध नहीं | F VI | emission | 1s2.2p.3p 1D → 1s2.2p.3d 1F* | मापित | NIST | |
| 456.45 nm | उपलब्ध नहीं | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | मापित | NIST | |
| 457.45 nm | उपलब्ध नहीं | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | मापित | NIST | |
| 457.96 nm | उपलब्ध नहीं | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | मापित | NIST | |
| 459.81 nm | उपलब्ध नहीं | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | मापित | NIST | |
| 460.57 nm | उपलब्ध नहीं | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | मापित | NIST | |
| 461.08 nm | उपलब्ध नहीं | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | मापित | NIST | |
| 463.41 nm | उपलब्ध नहीं | F VI | emission | 1s2.2p.4p 1P → 1s2.2p.4d 1P* | मापित | NIST | |
| 478.945 nm | उपलब्ध नहीं | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | मापित | NIST | |
| 478.945 nm | उपलब्ध नहीं | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | मापित | NIST | |
| 486.899 nm | उपलब्ध नहीं | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | मापित | NIST | |
| 486.899 nm | उपलब्ध नहीं | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | मापित | NIST | |
| 490.456 nm | उपलब्ध नहीं | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | मापित | NIST | |
| 507.4 nm | उपलब्ध नहीं | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | मापित | NIST | |
| 507.86 nm | उपलब्ध नहीं | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | मापित | NIST | |
| 509.78 nm | उपलब्ध नहीं | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | मापित | NIST | |
| 510.25 nm | उपलब्ध नहीं | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | मापित | NIST | |
| 511.78 nm | उपलब्ध नहीं | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | मापित | NIST | |
| 515.72 nm | उपलब्ध नहीं | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | मापित | NIST | |
| 517.29 nm | उपलब्ध नहीं | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | मापित | NIST | |
| 517.4 nm | उपलब्ध नहीं | F VIII | emission | 1s.3s 3S → 1s.3p 3P* | मापित | NIST | |
| 522.95 nm | उपलब्ध नहीं | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | मापित | NIST | |
| 525.1 nm | उपलब्ध नहीं | F VIII | emission | 1s.3s 3S → 1s.3p 3P* | मापित | NIST | |
| 528.03 nm | उपलब्ध नहीं | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2D | मापित | NIST | |
| 528.03 nm | उपलब्ध नहीं | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2D | मापित | NIST | |
| 528.03 nm | उपलब्ध नहीं | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2D | मापित | NIST | |
| 528.03 nm | उपलब्ध नहीं | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2D | मापित | NIST | |
| 533.07 nm | उपलब्ध नहीं | F VI | emission | 1s2.2p.3p 1S → 1s2.2p.3d 1P* | मापित | NIST | |
| 543.21 nm | उपलब्ध नहीं | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | मापित | NIST | |
| 544 nm | उपलब्ध नहीं | F VII | emission | 1s2.8p 2P* → 1s2.9d 2D | मापित | NIST | |
| 544 nm | उपलब्ध नहीं | F VII | emission | 1s2.8p 2P* → 1s2.9d 2D | मापित | NIST | |
| 544 nm | उपलब्ध नहीं | F VII | emission | 1s2.8p 2P* → 1s2.9d 2D | मापित | NIST | |
| 545.91 nm | उपलब्ध नहीं | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | मापित | NIST | |
| 549.84 nm | उपलब्ध नहीं | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | मापित | NIST | |
| 549.99 nm | उपलब्ध नहीं | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | मापित | NIST | |
| 556.76 nm | उपलब्ध नहीं | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | मापित | NIST | |
| 560.85 nm | उपलब्ध नहीं | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | मापित | NIST | |
| 568.67 nm | उपलब्ध नहीं | F V | emission | 2s.2p.(3P*).3s 2P* → 2s.2p.(3P*).3p 2P | मापित | NIST | |
| 572.12 nm | उपलब्ध नहीं | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | मापित | NIST | |
| 572.12 nm | उपलब्ध नहीं | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | मापित | NIST | |
| 572.15 nm | उपलब्ध नहीं | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | मापित | NIST | |
| 573.29 nm | उपलब्ध नहीं | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | मापित | NIST | |
| 573.29 nm | उपलब्ध नहीं | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | मापित | NIST | |
| 573.32 nm | उपलब्ध नहीं | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | मापित | NIST | |
| 573.32 nm | उपलब्ध नहीं | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | मापित | NIST | |
| 576.14 nm | उपलब्ध नहीं | F V | emission | 2s.2p.(3P*).3s 2P* → 2s.2p.(3P*).3p 2P | मापित | NIST | |
| 585.63 nm | उपलब्ध नहीं | F V | emission | 2s.2p.(3P*).3s 2P* → 2s.2p.(3P*).3p 2P | मापित | NIST | |
| 593.55 nm | उपलब्ध नहीं | F V | emission | 2s.2p.(3P*).3s 2P* → 2s.2p.(3P*).3p 2P | मापित | NIST | |
| 604 nm | उपलब्ध नहीं | F VII | emission | 1s2.8d 2D → 1s2.9p 2P* | मापित | NIST | |
| 604 nm | उपलब्ध नहीं | F VII | emission | 1s2.8d 2D → 1s2.9p 2P* | मापित | NIST | |
| 604 nm | उपलब्ध नहीं | F VII | emission | 1s2.8d 2D → 1s2.9p 2P* | मापित | NIST | |
| 683 nm | उपलब्ध नहीं | F VII | emission | 1s2.9p 2P* → 1s2.10d 2D | मापित | NIST | |
| 683 nm | उपलब्ध नहीं | F VII | emission | 1s2.9p 2P* → 1s2.10d 2D | मापित | NIST | |
| 683 nm | उपलब्ध नहीं | F VII | emission | 1s2.9p 2P* → 1s2.10d 2D | मापित | NIST | |
| 713.8 nm | उपलब्ध नहीं | F V | emission | 2s.2p.(3P*).4p 2D → 2s.2p.(3P*).4d 2F* | मापित | NIST | |
| 719.4 nm | उपलब्ध नहीं | F V | emission | 2s.2p.(3P*).4p 2D → 2s.2p.(3P*).4d 2F* | मापित | NIST | |
| 723.4 nm | उपलब्ध नहीं | F VI | emission | 1s2.2p.4s 1P* → 1s2.2p.4p 1D | मापित | NIST | |
| 728.5 nm | उपलब्ध नहीं | F VIII | emission | 1s.3s 1S → 1s.3p 1P* | मापित | NIST | |
| 735.8 nm | उपलब्ध नहीं | F V | emission | 2s.2p.(3P*).4p 2D → 2s.2p.(3P*).4d 2F* | मापित | NIST |
विस्तृत गुण
सहसंयोजक त्रिज्याएँ (विस्तृत)
- सहसंयोजक त्रिज्या (प्यूक्को)
- 64 pm
- सहसंयोजक त्रिज्या (प्यूक्को, द्विबंध)
- 59 pm
- सहसंयोजक त्रिज्या (प्यूक्को, त्रिबंध)
- 53 pm
- सहसंयोजक त्रिज्या (ब्रैग)
- 67 pm
वान डर वाल्स त्रिज्याएँ
- Bondi
- 147 pm
- Batsanov
- 150 pm
- Alvarez
- 146 pm
- UFF
- 336.4 pm
- MM3
- 171 pm
- Dreiding
- 347.2 pm
- Rowland–Taylor
- 146 pm
परमाणु और धात्विक त्रिज्याएँ
- परमाणु त्रिज्या (राह्म)
- 163 pm
संख्यांकन मापक्रम
- Mendeleev
- 106
- Pettifor
- 102
- Glawe
- 102
विद्युतऋणात्मकता मापक्रम
- Ghosh
- 0
- Gunnarsson–Lundqvist
- 11
- Robles–Bartolotti
- 10
ध्रुवणीयता और परिक्षेपण
- द्विध्रुव ध्रुवणीयता
- 3.74 a.u.
- द्विध्रुव ध्रुवणीयता (अनिश्चितता)
- 0.08 a.u.
- C₆
- 9.52 Ha·Bohr6
- C₆ (Gould–Bučko)
- 10.2 Ha·Bohr6
रासायनिक बंधुता
- प्रोटॉन बंधुता
- 340.1 kJ/mol
- गैसीय क्षारकता
- 315.1 kJ/mol
आपूर्ति जोखिम और अर्थशास्त्र
- उत्पादन संकेंद्रण
- 56
- सापेक्ष आपूर्ति जोखिम
- 7
- भंडार वितरण
- 17
- राजनीतिक स्थिरता (प्रमुख उत्पादक)
- 24
- राजनीतिक स्थिरता (सबसे अधिक भंडार वाला देश)
- 44
प्रावस्था संक्रमण और अपररूप
| गलनांक | 53.48 K |
| क्वथनांक | 85.04 K |
| क्रांतिक बिंदु (तापमान) | 144.41 K |
| क्रांतिक बिंदु (दाब) | 5.17 MPa |
| त्रिक बिंदु (तापमान) | 53.48 K |
| त्रिक बिंदु (दाब) | 90 kPa |
ऑक्सीकरण अवस्था की श्रेणियाँ
उन्नत संदर्भ डेटा
परिरक्षण स्थिरांक (3)
| n | कक्षक | σ |
|---|---|---|
| 1 | s | 0.3499 |
| 2 | p | 3.9 |
| 2 | s | 3.8724 |
क्रिस्टल त्रिज्याओं का विवरण (5)
| आवेश | CN | प्रचक्रण | rcrystal (pm) | उत्पत्ति |
|---|---|---|---|---|
| -1 | II | 114.5 | ||
| -1 | III | 116 | ||
| -1 | IV | 117 | ||
| -1 | VI | 119 | ||
| 7 | VI | 22 | Ahrens (1952) ionic radius, |
समस्थानिक क्षय के प्रकार (31)
| समस्थानिक | मोड | तीव्रता |
|---|---|---|
| 13 | p | — |
| 14 | p | — |
| 15 | p | 100% |
| 16 | p | 100% |
| 17 | B+ | 100% |
| 18 | B+ | 100% |
| 20 | B- | 100% |
| 21 | B- | 100% |
| 22 | B- | 100% |
| 22 | B-n | 11% |
एक्स-रे प्रकीर्णन गुणक (502)
| ऊर्जा (eV) | f₁ | f₂ |
|---|---|---|
| 10 | — | 0.05165 |
| 10.1617 | — | 0.05648 |
| 10.3261 | — | 0.06176 |
| 10.4931 | — | 0.06754 |
| 10.6628 | — | 0.07386 |
| 10.8353 | — | 0.08077 |
| 11.0106 | — | 0.08833 |
| 11.1886 | — | 0.09659 |
| 11.3696 | — | 0.10831 |
| 11.5535 | — | 0.12462 |
अतिरिक्त डेटा
Estimated Crustal Abundance
The estimated element abundance in the earth's crust.
5.85×102 milligrams per kilogram
संदर्भ (1)
- [5] Fluorine https://education.jlab.org/itselemental/ele009.html
Estimated Oceanic Abundance
The estimated element abundance in the earth's oceans.
1.3 milligrams per liter
संदर्भ (1)
- [5] Fluorine https://education.jlab.org/itselemental/ele009.html
संदर्भ
(9)
Data deposited in or computed by PubChem
The half-life and atomic mass data was provided by the Atomic Mass Data Center at the International Atomic Energy Agency.
Element data are cited from the Atomic weights of the elements (an IUPAC Technical Report). The IUPAC periodic table of elements can be found at https://iupac.org/what-we-do/periodic-table-of-elements/. Additional information can be found within IUPAC publication doi:10.1515/pac-2015-0703 Copyright © 2020 International Union of Pure and Applied Chemistry.
The information are cited from Pure Appl. Chem. 2018; 90(12): 1833-2092, https://doi.org/10.1515/pac-2015-0703.
Thomas Jefferson National Accelerator Facility (Jefferson Lab) is one of 17 national laboratories funded by the U.S. Department of Energy. The lab's primary mission is to conduct basic research of the atom's nucleus using the lab's unique particle accelerator, known as the Continuous Electron Beam Accelerator Facility (CEBAF). For more information visit https://www.jlab.org/
The periodic table at the LANL (Los Alamos National Laboratory) contains basic element information together with the history, source, properties, use, handling and more. The provenance data may be found from the link under the source name.
The periodic table contains NIST's critically-evaluated data on atomic properties of the elements. The provenance data that include data for atomic spectroscopy, X-ray and gamma ray, radiation dosimetry, nuclear physics, and condensed matter physics may be found from the link under the source name. Ref: https://www.nist.gov/pml/atomic-spectra-database
This section provides all form of data related to element Fluorine.
The element property data was retrieved from publications.