Fluorine (F)
halogenGas
ਮਿਆਰੀ ਪਰਮਾਣੂ ਭਾਰ
18.998403 uਇਲੈਕਟ੍ਰਾਨ ਵਿਨਿਆਸ
[He] 2s2 2p5ਪਿਘਲਣ ਦਰਜਾ
-219.62 °Cਉਬਾਲ ਦਰਜਾ
-188.12 °Cਘਣਤਾ
1.696 kg/m³ਆਕਸੀਕਰਨ ਅਵਸਥਾਵਾਂ
-1ਬਿਜਲਈ ਰਿਣਾਤਮਕਤਾ (ਪਾਲਿੰਗ)
3.98ਆਇਨੀਕਰਨ ਊਰਜਾ (ਪਹਿਲੀ)
17.42282 eVਖੋਜ ਦਾ ਸਾਲ
1886ਪਰਮਾਣੂ ਅਰਧ-ਵਿਆਸ
50 pmਵੇਰਵੇ
Fluorine is the lightest halogen and the most electronegative chemical element. In elemental form it occurs as diatomic fluorine, F₂, a highly reactive oxidizing gas. Natural fluorine is almost entirely the stable isotope ¹⁹F and is found in minerals rather than as the free element. Its chemistry underlies fluoride minerals, uranium enrichment chemistry, fluoropolymers, refrigerants, many agrochemicals, and a large share of modern medicinal chemistry.
Fluorine is the most electronegative and reactive of all elements. It is a pale yellow, corrosive gas, which reacts with most organic and inorganic substances. Finely divided metals, glass, ceramics, carbon, and even water burn in fluorine with a bright flame.
Until World War II, there was no commercial production of elemental fluorine. The nuclear bomb project and nuclear energy applications, however, made it necessary to produce large quantities.
The name derives from the Latin fluere for "flow" or "flux" because fluorite (CaF2) was used as a flux in metallurgy owing to its low melting point. It was discovered in hydrofluoric acid by the Swedish pharmacist and chemist Carl-Wilhelm Scheele in 1771, but it was not isolated until 1886 by the French pharmacist and chemist Henri Moissan.
Fluorine is the most reactive of all elements and no chemical substance is capable of freeing fluorine from any of its compounds. For this reason, fluorine does not occur free in nature and was extremely difficult for scientists to isolate. The first recorded use of a fluorine compound dates to around 1670 to a set of instructions for etching glass that called for Bohemian emerald (CaF2). Chemists attempted to identify the material that was capable of etching glass and George Gore was able to produce a small amount of fluorine through an electrolytic process in 1869. Unknown to Gore, fluorine gas explosively combines with hydrogen gas. That is exactly what happened in Gore's experiment when the fluorine gas that formed on one electrode combined with the hydrogen gas that formed on the other electrode. Ferdinand Frederic Henri Moissan, a French chemist, was the first to successfully isolate fluorine in 1886. He did this through the electrolysis of potassium fluoride (KF) and hydrofluoric acid (HF). He also completely isolated the fluorine gas from the hydrogen gas and he built his electrolysis device completely from platinum. His work was so impressive that he was awarded the Nobel Prize for chemistry in 1906. Today, fluorine is still produced through the electrolysis of potassium fluoride and hydrofluoric acid as well as through the electrolysis of molten potassium acid fluoride (KHF2).
From the Latin and French fluere: flow or flux. In 1529, Georigius Agricola described the use of fluorspar as a flux, and as early as 1670 Schwandhard found that glass was etched when exposed to fluorspar treated with acid. Scheele and many later investigators, including Davy, Gay-Lussac, Lavoisier, and Thenard, experimented with hydrofluoric acid, some experiments ending tragically.
The element was finally isolated in 1866 by Moissan after nearly 74 years of continuous effort.
Pure fluorine, F₂, is a pale yellow gas at ordinary temperature and pressure. It condenses to a yellow liquid and freezes to a pale solid at low temperature. The gas has a sharp, irritating odor, but odor is not a safe means of detection.
Elemental fluorine, F₂, is used mainly where its extreme oxidizing and fluorinating power is required, including preparation of uranium hexafluoride, UF₆, for isotope separation and manufacture of some specialty inorganic fluorides. Much larger practical importance lies in fluorine-containing compounds. Fluoropolymers such as polytetrafluoroethylene, (C₂F₄)ₙ, are used for chemically resistant coatings, seals, membranes, and electrical insulation. Fluoride compounds are used in glass etching, aluminum production, dental products, pharmaceuticals, and crop-protection chemicals.
Fluorine is added to city water supplies in the proportion of about one part per million to help prevent tooth decay. Sodium fluoride (NaF), stannous(II) fluoride (SnF2) and sodium monofluorophosphate (Na2PO3F) are all fluorine compounds added to toothpaste, also to help prevent tooth decay. Hydrofluoric acid (HF) is used to etch glass, including most of the glass used in light bulbs. Uranium hexafluoride (UF6) is used to separate isotopes of uranium. Crystals of calcium fluoride (CaF2), also known as fluorite and fluorspar, are used to make lenses to focus infrared light. Fluorine joins with carbon to form a class of compounds known as fluorocarbons. Some of these compounds, such as dichlorodifluoromethane (CF2Cl2), were widely used in air conditioning and refrigeration systems and in aerosol spray cans, but have been phased out due to the damage they were causing to the earth's ozone layer.
Fluorine and its compounds are used in producing uranium (from the hexafluoride) and more than 100 commercial fluorochemicals, including many high-temperature plastics. Hydrofluoric acid etches glass of light bulbs. Fluorochlorohydrocarbons are extensively used in air conditioning and refrigeration.
The presence of fluorine as a soluble fluoride in drinking water to the extent of 2 ppm may cause mottled enamel in teeth when used by children acquiring permanent teeth; in smaller amounts, however, fluoride helps prevent dental cavities.
Elemental fluorine has been studied as a rocket propellant as it has an exceptionally high specific impulse value.
Isotopes in Medicine
18F is a radioactive fluorine isotope that is used in an 18F-FDG compound (18F-labeled, fluoro-deoxy glucose) for imaging the organs, bones, tissues, and brain of the body with a technique called positron emission topography (PET). The 18F-FDG compound is injected and the isotopically labeled glucose is consumed by any cell requiring glucose as a source of energy [98] R. Krebs. The History And Use Of Our Earth’s Chemical Elements: A Reference Guide, 2nd ed. Greenwood Press, Westport, CT (2006)., [99] World Nuclear Association. Radioisotopes in Medicine, World Nuclear Association (2014), Feb. 23; http://www.world-nuclear.org/info/inf55.html..
– 18F emits positrons that collect in tissue and interact with regular negative electrons when injected into the body. The positrons and electrons annihilate each other, producing two gamma rays that are emitted in opposite directions. The radiation is detected on a PET camera, which generates a picture of the body part being examined (Fig. IUPAC.9.1).
–Because 18F has a short half-life of about 110 min, there is little chance of radiation damage to the patient.
Fluorine most commonly has oxidation state −1 in compounds, as in hydrogen fluoride, HF, sodium fluoride, NaF, and calcium fluoride, CaF₂. With highly electropositive elements it forms ionic fluorides; with nonmetals it forms strongly covalent fluorides such as sulfur hexafluoride, SF₆, and silicon tetrafluoride, SiF₄. Fluorine can also form interhalogen compounds, including chlorine trifluoride, ClF₃. Oxygen fluorides such as oxygen difluoride, OF₂, are unusual because fluorine is assigned the negative oxidation state while oxygen is positive.
One hypothesis says that fluorine can be substituted for hydrogen wherever it occurs in organic compounds, which could lead to an astronomical number of new fluorine compounds. Compounds of fluorine with rare gases have now been confirmed in fluorides of xenon, radon, and krypton.
See more information at the Fluorine compound page.
Elemental fluorine, F₂, is acutely toxic, corrosive, and a powerful oxidizer that can ignite or violently react with many materials. Hydrogen fluoride, HF, is especially hazardous because it penetrates tissue and binds calcium and magnesium ions. Soluble fluorides can be toxic at sufficient dose, while controlled low concentrations of fluoride ion, F⁻, have dental uses. Some fluorinated gases are chemically stable but may be asphyxiants or potent greenhouse gases.
Elemental fluorine and the fluoride ion are highly toxic. The free element has a characteristic pungent odor, detectable in concentrations as low as 20 ppb, which is below the safe working level. The recommended maximum allowable concentration for a daily 8-hour time-weighted exposure is 1 ppm.
Fluorine enters the environment chiefly as fluoride in minerals, volcanic emissions, sea spray, industrial releases, and weathering products. Fluoride ion, F⁻, binds to calcium, aluminum, and iron phases and can be immobilized in soils or sediments, though mobility depends strongly on pH and water chemistry. Elevated natural or industrial fluoride in groundwater can affect teeth, bones, livestock, and vegetation. Persistent organofluorine compounds vary widely in mobility and degradation behavior.
Fluorine supply is based primarily on mining fluorite, CaF₂, with smaller contributions from fluorapatite-bearing phosphate rock processed in fertilizer production. Hydrogen fluoride, HF, is the central industrial intermediate, made by treating fluorite with sulfuric acid, H₂SO₄. Direct production and transport of elemental fluorine are limited by its reactivity, so it is commonly generated or consumed close to the point of use. Demand is tied to aluminum smelting, chemical manufacturing, electronics materials, fluoropolymers, and regulated refrigerant transitions. Recycling is important for some fluorinated materials but is often chemically or economically difficult.
Found in the minerals fluorite (CaF2) and cryolite(Na3AlF6). Electrolysis of hydrofluoric acid (HF) or potassium acid fluoride (KHF2) is the only practical method of commercial production.
Fluorine is relatively rare in the cosmos compared with neighboring light elements. It is thought to be made in several settings, including helium-burning regions of evolved stars, neutrino-driven processes in core-collapse supernovae, and possibly novae, with their relative contributions still studied. In planetary materials it is concentrated into minerals, melts, and volatile-bearing phases rather than remaining as free F₂.
- Fluorine has only one stable natural isotope, ¹⁹F.
- Fluorite, CaF₂, gave the element its name through its use as a flux.
- Glass etching by hydrogen fluoride, HF, reflects the strength of silicon-fluorine bonding.
- Polytetrafluoroethylene, (C₂F₄)ₙ, was discovered accidentally during refrigerant research.
- Uranium hexafluoride, UF₆, is volatile enough for gas-phase isotope enrichment.
- Fluoride minerals can preserve fluorine in rocks over geologic time.
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- ਮੋਲਰ ਆਇਤਨ
- 0.0171 L/mol
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- ਪਿਘਲਣ ਦਰਜਾ
- -219.62 °C ਸਾਰੇ ਤੱਤਾਂ ਦੀ ਪਿਘਲਣ ਦਰਜਾ ਦੀ ਤੁਲਨਾ ਕਰੋ →
- ਉਬਾਲ ਦਰਜਾ
- -188.12 °C ਸਾਰੇ ਤੱਤਾਂ ਦੀ ਉਬਾਲ ਦਰਜਾ ਦੀ ਤੁਲਨਾ ਕਰੋ →
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ਰਸਾਇਣਕ
- ਬਿਜਲਈ ਰਿਣਾਤਮਕਤਾ (ਪਾਲਿੰਗ)
- 3.98 ਸਾਰੇ ਤੱਤਾਂ ਦੀ ਬਿਜਲਈ ਰਿਣਾਤਮਕਤਾ (ਪਾਲਿੰਗ) ਦੀ ਤੁਲਨਾ ਕਰੋ →
- ਬਿਜਲਈ ਰਿਣਾਤਮਕਤਾ (ਐਲਨ)
- 4.193
- ਇਲੈਕਟ੍ਰਾਨ ਬੰਧੁਤਾ
- 3.4011 eV
- ਆਇਨੀਕਰਨ ਊਰਜਾ (ਪਹਿਲੀ)
- 17.42282 eV ਸਾਰੇ ਤੱਤਾਂ ਦੀ ਆਇਨੀਕਰਨ ਊਰਜਾ (ਪਹਿਲੀ) ਦੀ ਤੁਲਨਾ ਕਰੋ →
- ਆਇਨੀਕਰਨ ਊਰਜਾ (ਦੂਜੀ)
- 34.97093 eV ਸਾਰੇ ਤੱਤਾਂ ਦੀ ਆਇਨੀਕਰਨ ਊਰਜਾ (ਦੂਜੀ) ਦੀ ਤੁਲਨਾ ਕਰੋ →
- ਆਇਨੀਕਰਨ ਊਰਜਾ (ਤੀਜੀ)
- 62.708196 eV ਸਾਰੇ ਤੱਤਾਂ ਦੀ ਆਇਨੀਕਰਨ ਊਰਜਾ (ਤੀਜੀ) ਦੀ ਤੁਲਨਾ ਕਰੋ →
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- 87.1753 eV ਸਾਰੇ ਤੱਤਾਂ ਦੀ ਆਇਨੀਕਰਨ ਊਰਜਾ (ਚੌਥੀ) ਦੀ ਤੁਲਨਾ ਕਰੋ →
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- ਆਕਸੀਕਰਨ ਅਵਸਥਾਵਾਂ
- -1 ਸਾਰੇ ਤੱਤਾਂ ਦੀ ਆਕਸੀਕਰਨ ਅਵਸਥਾਵਾਂ ਦੀ ਤੁਲਨਾ ਕਰੋ →
- ਸੰਯੋਜਕ ਇਲੈਕਟ੍ਰਾਨ
- 7 ਸਾਰੇ ਤੱਤਾਂ ਦੀ ਸੰਯੋਜਕ ਇਲੈਕਟ੍ਰਾਨ ਦੀ ਤੁਲਨਾ ਕਰੋ →
- ਇਲੈਕਟ੍ਰਾਨ ਵਿਨਿਆਸ
- [He] 2s2 2p5
ਤਾਪਗਤੀਕੀ
- ਤਿਹਰਾ ਬਿੰਦੂ (ਤਾਪਮਾਨ)
- -219.67 °C
- ਤਿਹਰਾ ਬਿੰਦੂ (ਦਬਾਅ)
- 9e+4 Pa
- ਕ੍ਰਾਂਤਿਕ ਬਿੰਦੂ (ਤਾਪਮਾਨ)
- -128.74 °C
- ਕ੍ਰਾਂਤਿਕ ਬਿੰਦੂ (ਦਬਾਅ)
- 5.1724e+6 Pa
- ਪਿਘਲਣ ਦਾ ਤਾਪ
- 0.0026429 eV ਸਾਰੇ ਤੱਤਾਂ ਦੀ ਪਿਘਲਣ ਦਾ ਤਾਪ ਦੀ ਤੁਲਨਾ ਕਰੋ →
- ਵਾਸ਼ਪੀਕਰਨ ਦਾ ਤਾਪ
- 0.06778256 eV ਸਾਰੇ ਤੱਤਾਂ ਦੀ ਵਾਸ਼ਪੀਕਰਨ ਦਾ ਤਾਪ ਦੀ ਤੁਲਨਾ ਕਰੋ →
- ਪਰਮਾਣੂਕਰਨ ਦਾ ਤਾਪ
- 0.8228222 eV
- ਪਰਮਾਣੂਕਰਨ ਐਂਥੈਲਪੀ
- 0.82225216 eV
ਨਾਭਿਕੀ
- ਪ੍ਰੋਟਾਨ
- 9 ਸਾਰੇ ਤੱਤਾਂ ਦੀ ਪ੍ਰੋਟਾਨ ਦੀ ਤੁਲਨਾ ਕਰੋ →
- ਨਿਊਟ੍ਰਾਨ
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- ਜਾਣੇ-ਪਛਾਣੇ ਸਮਸਥਾਨਿਕ
- 19 ਸਾਰੇ ਤੱਤਾਂ ਦੀ ਜਾਣੇ-ਪਛਾਣੇ ਸਮਸਥਾਨਿਕ ਦੀ ਤੁਲਨਾ ਕਰੋ →
- ਸਥਿਰ ਸਮਸਥਾਨਿਕ
- 1 ਸਾਰੇ ਤੱਤਾਂ ਦੀ ਸਥਿਰ ਸਮਸਥਾਨਿਕ ਦੀ ਤੁਲਨਾ ਕਰੋ →
- ਸਭ ਤੋਂ ਸਥਿਰ ਸਮਸਥਾਨਿਕ
- F-19
- ਖੋਜ ਦਾ ਸਾਲ
- 1886
ਪ੍ਰਚੁਰਤਾ
- ਪ੍ਰਚੁਰਤਾ (ਧਰਤੀ ਦੀ ਛਾਲ)
- 585 mg/kg ਸਾਰੇ ਤੱਤਾਂ ਦੀ ਪ੍ਰਚੁਰਤਾ (ਧਰਤੀ ਦੀ ਛਾਲ) ਦੀ ਤੁਲਨਾ ਕਰੋ →
- ਪ੍ਰਚੁਰਤਾ (ਮਹਾਂਸਾਗਰ)
- 1.3 mg/L ਸਾਰੇ ਤੱਤਾਂ ਦੀ ਪ੍ਰਚੁਰਤਾ (ਮਹਾਂਸਾਗਰ) ਦੀ ਤੁਲਨਾ ਕਰੋ →
ਕ੍ਰਿਸਟਲ ਬਣਤਰ
ਉਪਲਬਧ ਨਹੀਂ
ਇਲੈਕਟ੍ਰਾਨਿਕ ਬਣਤਰ
- ਪ੍ਰਤੀ ਖੋਲ ਇਲੈਕਟ੍ਰਾਨ
- 2, 7 ਸਾਰੇ ਤੱਤਾਂ ਦੀ ਪ੍ਰਤੀ ਖੋਲ ਇਲੈਕਟ੍ਰਾਨ ਦੀ ਤੁਲਨਾ ਕਰੋ →
ਪਛਾਣਕਰਤਾ
- CAS ਸੰਖਿਆ
- 7782-41-4 ਸਾਰੇ ਤੱਤਾਂ ਦੀ CAS ਸੰਖਿਆ ਦੀ ਤੁਲਨਾ ਕਰੋ →
- ਟਰਮ ਪ੍ਰਤੀਕ
- 2P°3/2
- InChI
- InChI=1S/F
- InChI ਕੁੰਜੀ
- YCKRFDGAMUMZLT-UHFFFAOYSA-N
ਇਲੈਕਟ੍ਰਾਨ ਵਿਨਿਆਸ ਮਾਪਿਆ
F: 2s² 2p⁵[He] 2s² 2p⁵1s² 2s² 2p⁵ਪਰਮਾਣੂ ਮਾਡਲ
ਸਮਸਥਾਨਿਕ ਨਿਊਟ੍ਰਾਨਾਂ ਦੀ ਗਿਣਤੀ, ਪੁੰਜ ਅਤੇ ਸਥਿਰਤਾ ਬਦਲਦੇ ਹਨ — ਉਦਾਸੀਨ ਪਰਮਾਣੂ ਦਾ ਇਲੈਕਟ੍ਰਾਨ ਵਿਨਿਆਸ ਨਹੀਂ।
ਸੰਕੇਤਕ ਪਰਮਾਣੂ ਮਾਡਲ, ਪੈਮਾਨੇ ਅਨੁਸਾਰ ਨਹੀਂ।
ਪਰਮਾਣੂ ਪਛਾਣ-ਚਿੰਨ੍ਹ
ਨਿਕਾਸ / ਅਵਸ਼ੋਸ਼ਣ ਸਪੈਕਟ੍ਰਮ
ਸਮਸਥਾਨਿਕ ਵੰਡ
| ਪੁੰਜ ਸੰਖਿਆ | ਪਰਮਾਣੂ ਪੁੰਜ (u) | ਕੁਦਰਤੀ ਪ੍ਰਚੁਰਤਾ | ਅਰਧ-ਆਯੂ |
|---|---|---|---|
| 19 ਸਥਿਰ | 18.99840316273 ± 0.00000000092 | 100.0000% | ਸਥਿਰ |
ਫੇਜ਼ / ਅਵਸਥਾ
ਕਾਰਨ: ਉਬਾਲ ਦਰਜੇ (-188.12 °C) ਤੋਂ 213.1 °C ਵੱਧ
ਸੰਕੇਤਕ, ਪੈਮਾਨੇ ਅਨੁਸਾਰ ਨਹੀਂ
ਅਵਸਥਾ ਪਰਿਵਰਤਨ ਬਿੰਦੂ
ਸੰਕ੍ਰਮਣ ਊਰਜਾਵਾਂ
ਪਿਘਲਣ ਦਰਜੇ 'ਤੇ 1 mol ਨੂੰ ਪਿਘਲਾਉਣ ਲਈ ਲੋੜੀਂਦੀ ਊਰਜਾ
ਉਬਾਲ ਦਰਜੇ 'ਤੇ 1 mol ਦੇ ਵਾਸ਼ਪੀਕਰਨ ਲਈ ਲੋੜੀਂਦੀ ਊਰਜਾ
ਘਣਤਾ
ਮਿਆਰੀ ਹਾਲਤਾਂ 'ਤੇ
ਮੌਜੂਦਾ T 'ਤੇ ਆਦਰਸ਼ ਗੈਸ ਨਿਯਮ ਰਾਹੀਂ ਅਨੁਮਾਨਿਤ
ਉੱਨਤ
ਪਰਮਾਣੂ ਸਪੈਕਟ੍ਰਮ
ਉਪਲਬਧ ਸਪੈਕਟ੍ਰਮੀ ਰੇਖਾਵਾਂ ?
| ਆਇਨ | ਆਵੇਸ਼ | ਕੁੱਲ ਰੇਖਾਵਾਂ | ਸੰਕ੍ਰਮਣ ਸੰਭਾਵਨਾਵਾਂ | ਪੱਧਰਾਂ ਦੇ ਨਾਮਾਂਕਨ |
|---|---|---|---|---|
| F I | 0 | 162 | 120 | 162 |
| F II | +1 | 150 | 67 | 67 |
| F III | +2 | 141 | 34 | 34 |
| F IV | +3 | 75 | 30 | 30 |
| F V | +4 | 513 | 472 | 472 |
| F VI | +5 | 269 | 269 | 269 |
| F VII | +6 | 470 | 439 | 470 |
| F VIII | +7 | 128 | 128 | 128 |
| F IX | +8 | 137 | 137 | 137 |
ਉਪਲਬਧ ਊਰਜਾ ਪੱਧਰ ?
| ਆਇਨ | ਆਵੇਸ਼ | ਪੱਧਰ |
|---|---|---|
| F I | 0 | 303 |
| F II | +1 | 291 |
| F III | +2 | 278 |
| F IV | +3 | 170 |
| F V | +4 | 138 |
| F VI | +5 | 100 |
| F VII | +6 | 77 |
| F VIII | +7 | 151 |
| F IX | +8 | 149 |
ਆਇਨਿਕ ਅਰਧ-ਵਿਆਸ
| ਆਵੇਸ਼ | ਉਪਸਹਿ-ਸੰਯੋਜਨ | ਸਪਿਨ | ਅਰਧ-ਵਿਆਸ |
|---|---|---|---|
| -1 | 2 | ਉਪਲਬਧ ਨਹੀਂ | 128.5 pm |
| -1 | 3 | ਉਪਲਬਧ ਨਹੀਂ | 130 pm |
| -1 | 4 | ਉਪਲਬਧ ਨਹੀਂ | 131 pm |
| -1 | 6 | ਉਪਲਬਧ ਨਹੀਂ | 133 pm |
| +7 | 6 | ਉਪਲਬਧ ਨਹੀਂ | 8 pm |
ਯੋਗਿਕ
ਸਮਸਥਾਨਿਕ (1)
| ਪੁੰਜ ਸੰਖਿਆ | ਪਰਮਾਣੂ ਪੁੰਜ (u) | ਕੁਦਰਤੀ ਪ੍ਰਚੁਰਤਾ | ਅਰਧ-ਆਯੂ | ਖ਼ੈ ਦੀ ਵਿਧੀ | |
|---|---|---|---|---|---|
| 19 ਸਥਿਰ | 18.99840316273 ± 0.00000000092 | 100.0000% | ਸਥਿਰ | stable |
ਸਪੈਕਟ੍ਰਮੀ ਰੇਖਾਵਾਂ
| ਤਰੰਗ-ਲੰਬਾਈ (nm) | ਤੀਬਰਤਾ | ਆਇਨੀਕਰਨ ਪੜਾਅ | ਕਿਸਮ | ਸੰਕ੍ਰਮਣ | ਸ਼ੁੱਧਤਾ | ਸਰੋਤ | |
|---|---|---|---|---|---|---|---|
| 383.22 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2s.2p.(3P*).4d 2F* → 2p2.(1D).3d 2D | ਮਾਪਿਆ | NIST | |
| 384.7086 nm | 270 | F II | emission | 2s2.2p3.(4S*).3s 5S* → 2s2.2p3.(4S*).3p 5P | ਮਾਪਿਆ | NIST | |
| 384.9985 nm | 260 | F II | emission | 2s2.2p3.(4S*).3s 5S* → 2s2.2p3.(4S*).3p 5P | ਮਾਪਿਆ | NIST | |
| 385.1668 nm | 250 | F II | emission | 2s2.2p3.(4S*).3s 5S* → 2s2.2p3.(4S*).3p 5P | ਮਾਪਿਆ | NIST | |
| 385.69 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2s.3s 1S → 1s2.2s.3p 3P* | ਮਾਪਿਆ | NIST | |
| 385.712 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2p2.(3P).3p 4S* → 2p2.(3P).3d 4P | ਮਾਪਿਆ | NIST | |
| 387.086 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2p2.(3P).3p 4S* → 2p2.(3P).3d 4P | ਮਾਪਿਆ | NIST | |
| 388.508 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | ਮਾਪਿਆ | NIST | |
| 388.6 nm | ਉਪਲਬਧ ਨਹੀਂ | F VII | emission | 1s2.7f 2F* → 1s2.8g 2G | ਮਾਪਿਆ | NIST | |
| 388.6 nm | ਉਪਲਬਧ ਨਹੀਂ | F VII | emission | 1s2.7f 2F* → 1s2.8g 2G | ਮਾਪਿਆ | NIST | |
| 388.6 nm | ਉਪਲਬਧ ਨਹੀਂ | F VII | emission | 1s2.7f 2F* → 1s2.8g 2G | ਮਾਪਿਆ | NIST | |
| 389.2 nm | ਉਪਲਬਧ ਨਹੀਂ | F VII | emission | 1s2.7f 2F* → 1s2.8d 2D | ਮਾਪਿਆ | NIST | |
| 389.2 nm | ਉਪਲਬਧ ਨਹੀਂ | F VII | emission | 1s2.7f 2F* → 1s2.8d 2D | ਮਾਪਿਆ | NIST | |
| 389.2 nm | ਉਪਲਬਧ ਨਹੀਂ | F VII | emission | 1s2.7f 2F* → 1s2.8d 2D | ਮਾਪਿਆ | NIST | |
| 390.229 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2p2.(3P).3p 4S* → 2p2.(3P).3d 4P | ਮਾਪਿਆ | NIST | |
| 390.45 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | ਮਾਪਿਆ | NIST | |
| 394.51 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2F | ਮਾਪਿਆ | NIST | |
| 394.51 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2F | ਮਾਪਿਆ | NIST | |
| 394.51 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2F | ਮਾਪਿਆ | NIST | |
| 394.518 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | ਮਾਪਿਆ | NIST | |
| 394.736 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | ਮਾਪਿਆ | NIST | |
| 396.08 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | ਮਾਪਿਆ | NIST | |
| 396.113 nm | ਉਪਲਬਧ ਨਹੀਂ | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | ਮਾਪਿਆ | NIST | |
| 399.6 nm | ਉਪਲਬਧ ਨਹੀਂ | F VII | emission | 1s2.7d 2D → 1s2.8p 2P* | ਮਾਪਿਆ | NIST | |
| 399.6 nm | ਉਪਲਬਧ ਨਹੀਂ | F VII | emission | 1s2.7d 2D → 1s2.8p 2P* | ਮਾਪਿਆ | NIST | |
| 399.6 nm | ਉਪਲਬਧ ਨਹੀਂ | F VII | emission | 1s2.7d 2D → 1s2.8p 2P* | ਮਾਪਿਆ | NIST | |
| 399.692 nm | ਉਪਲਬਧ ਨਹੀਂ | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | ਮਾਪਿਆ | NIST | |
| 399.692 nm | ਉਪਲਬਧ ਨਹੀਂ | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | ਮਾਪਿਆ | NIST | |
| 400.26 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | ਮਾਪਿਆ | NIST | |
| 400.942 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | ਮਾਪਿਆ | NIST | |
| 402.4726 nm | 240 | F II | emission | 2s2.2p3.(4S*).3s 3S* → 2s2.2p3.(4S*).3p 3P | ਮਾਪਿਆ | NIST | |
| 402.501 nm | 220 | F II | emission | 2s2.2p3.(4S*).3s 3S* → 2s2.2p3.(4S*).3p 3P | ਮਾਪਿਆ | NIST | |
| 402.5491 nm | 230 | F II | emission | 2s2.2p3.(4S*).3s 3S* → 2s2.2p3.(4S*).3p 3P | ਮਾਪਿਆ | NIST | |
| 405.99 nm | ਉਪਲਬਧ ਨਹੀਂ | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | ਮਾਪਿਆ | NIST | |
| 405.99 nm | ਉਪਲਬਧ ਨਹੀਂ | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | ਮਾਪਿਆ | NIST | |
| 410.3075 nm | 190 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | ਮਾਪਿਆ | NIST | |
| 410.3213 nm | 170 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | ਮਾਪਿਆ | NIST | |
| 410.3506 nm | 200 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | ਮਾਪਿਆ | NIST | |
| 410.3713 nm | 180 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | ਮਾਪਿਆ | NIST | |
| 410.387 nm | 170 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | ਮਾਪਿਆ | NIST | |
| 410.4008 nm | ਉਪਲਬਧ ਨਹੀਂ | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | ਮਾਪਿਆ | NIST | |
| 410.916 nm | 170 | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | ਮਾਪਿਆ | NIST | |
| 411.03 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2s.3p 1P* → 1s2.2s.3d 3D | ਮਾਪਿਆ | NIST | |
| 411.272 nm | ਉਪਲਬਧ ਨਹੀਂ | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | ਮਾਪਿਆ | NIST | |
| 411.2969 nm | ਉਪਲਬਧ ਨਹੀਂ | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | ਮਾਪਿਆ | NIST | |
| 411.44 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2s.3p 1P* → 1s2.2s.3d 3D | ਮਾਪਿਆ | NIST | |
| 411.6535 nm | 160 | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | ਮਾਪਿਆ | NIST | |
| 411.699 nm | ਉਪਲਬਧ ਨਹੀਂ | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | ਮਾਪਿਆ | NIST | |
| 411.8752 nm | ਉਪਲਬਧ ਨਹੀਂ | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | ਮਾਪਿਆ | NIST | |
| 411.9207 nm | 150 | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | ਮਾਪਿਆ | NIST | |
| 415.775 nm | ਉਪਲਬਧ ਨਹੀਂ | F II | emission | 2s2.2p4 1D → 2s2.2p4 1S | ਮਾਪਿਆ | NIST | |
| 423.3 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | ਮਾਪਿਆ | NIST | |
| 424.76 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | ਮਾਪਿਆ | NIST | |
| 426.19 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2s.2p.(3P*).3p 2D → 2s.2p.(3P*).3d 2D* | ਮਾਪਿਆ | NIST | |
| 426.28 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2s.3s 1S → 1s2.2s.3p 1P* | ਮਾਪਿਆ | NIST | |
| 427.32 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | ਮਾਪਿਆ | NIST | |
| 427.94 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2s.2p.(3P*).3p 2D → 2s.2p.(3P*).3d 2D* | ਮਾਪਿਆ | NIST | |
| 429.9165 nm | 200 | F II | emission | 2s2.2p3.(2D*).3s 1D* → 2s2.2p3.(2D*).3p 1F | ਮਾਪਿਆ | NIST | |
| 432.27 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | ਮਾਪਿਆ | NIST | |
| 433.94 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | ਮਾਪਿਆ | NIST | |
| 435.28 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2s.2p.(3P*).3p 2D → 2s.2p.(3P*).3d 2D* | ਮਾਪਿਆ | NIST | |
| 437.11 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2s.2p.(3P*).3p 2D → 2s.2p.(3P*).3d 2D* | ਮਾਪਿਆ | NIST | |
| 439.05 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | ਮਾਪਿਆ | NIST | |
| 444.6527 nm | 160 | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | ਮਾਪਿਆ | NIST | |
| 444.6689 nm | ਉਪਲਬਧ ਨਹੀਂ | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | ਮਾਪਿਆ | NIST | |
| 444.6721 nm | 170 | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | ਮਾਪਿਆ | NIST | |
| 444.7117 nm | ਉਪਲਬਧ ਨਹੀਂ | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | ਮਾਪਿਆ | NIST | |
| 444.7148 nm | ਉਪਲਬਧ ਨਹੀਂ | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | ਮਾਪਿਆ | NIST | |
| 444.7188 nm | 180 | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | ਮਾਪਿਆ | NIST | |
| 455.99 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2p.3p 1D → 1s2.2p.3d 1F* | ਮਾਪਿਆ | NIST | |
| 456.45 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | ਮਾਪਿਆ | NIST | |
| 457.45 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | ਮਾਪਿਆ | NIST | |
| 457.96 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | ਮਾਪਿਆ | NIST | |
| 459.81 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | ਮਾਪਿਆ | NIST | |
| 460.57 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | ਮਾਪਿਆ | NIST | |
| 461.08 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | ਮਾਪਿਆ | NIST | |
| 463.41 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2p.4p 1P → 1s2.2p.4d 1P* | ਮਾਪਿਆ | NIST | |
| 478.945 nm | ਉਪਲਬਧ ਨਹੀਂ | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | ਮਾਪਿਆ | NIST | |
| 478.945 nm | ਉਪਲਬਧ ਨਹੀਂ | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | ਮਾਪਿਆ | NIST | |
| 486.899 nm | ਉਪਲਬਧ ਨਹੀਂ | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | ਮਾਪਿਆ | NIST | |
| 486.899 nm | ਉਪਲਬਧ ਨਹੀਂ | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | ਮਾਪਿਆ | NIST | |
| 490.456 nm | ਉਪਲਬਧ ਨਹੀਂ | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | ਮਾਪਿਆ | NIST | |
| 507.4 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | ਮਾਪਿਆ | NIST | |
| 507.86 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | ਮਾਪਿਆ | NIST | |
| 509.78 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | ਮਾਪਿਆ | NIST | |
| 510.25 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | ਮਾਪਿਆ | NIST | |
| 511.78 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | ਮਾਪਿਆ | NIST | |
| 515.72 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | ਮਾਪਿਆ | NIST | |
| 517.29 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | ਮਾਪਿਆ | NIST | |
| 517.4 nm | ਉਪਲਬਧ ਨਹੀਂ | F VIII | emission | 1s.3s 3S → 1s.3p 3P* | ਮਾਪਿਆ | NIST | |
| 522.95 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | ਮਾਪਿਆ | NIST | |
| 525.1 nm | ਉਪਲਬਧ ਨਹੀਂ | F VIII | emission | 1s.3s 3S → 1s.3p 3P* | ਮਾਪਿਆ | NIST | |
| 528.03 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2D | ਮਾਪਿਆ | NIST | |
| 528.03 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2D | ਮਾਪਿਆ | NIST | |
| 528.03 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2D | ਮਾਪਿਆ | NIST | |
| 528.03 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2D | ਮਾਪਿਆ | NIST | |
| 533.07 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2p.3p 1S → 1s2.2p.3d 1P* | ਮਾਪਿਆ | NIST | |
| 543.21 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | ਮਾਪਿਆ | NIST | |
| 544 nm | ਉਪਲਬਧ ਨਹੀਂ | F VII | emission | 1s2.8p 2P* → 1s2.9d 2D | ਮਾਪਿਆ | NIST | |
| 544 nm | ਉਪਲਬਧ ਨਹੀਂ | F VII | emission | 1s2.8p 2P* → 1s2.9d 2D | ਮਾਪਿਆ | NIST | |
| 544 nm | ਉਪਲਬਧ ਨਹੀਂ | F VII | emission | 1s2.8p 2P* → 1s2.9d 2D | ਮਾਪਿਆ | NIST | |
| 545.91 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | ਮਾਪਿਆ | NIST | |
| 549.84 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | ਮਾਪਿਆ | NIST | |
| 549.99 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | ਮਾਪਿਆ | NIST | |
| 556.76 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | ਮਾਪਿਆ | NIST | |
| 560.85 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | ਮਾਪਿਆ | NIST | |
| 568.67 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2s.2p.(3P*).3s 2P* → 2s.2p.(3P*).3p 2P | ਮਾਪਿਆ | NIST | |
| 572.12 nm | ਉਪਲਬਧ ਨਹੀਂ | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | ਮਾਪਿਆ | NIST | |
| 572.12 nm | ਉਪਲਬਧ ਨਹੀਂ | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | ਮਾਪਿਆ | NIST | |
| 572.15 nm | ਉਪਲਬਧ ਨਹੀਂ | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | ਮਾਪਿਆ | NIST | |
| 573.29 nm | ਉਪਲਬਧ ਨਹੀਂ | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | ਮਾਪਿਆ | NIST | |
| 573.29 nm | ਉਪਲਬਧ ਨਹੀਂ | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | ਮਾਪਿਆ | NIST | |
| 573.32 nm | ਉਪਲਬਧ ਨਹੀਂ | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | ਮਾਪਿਆ | NIST | |
| 573.32 nm | ਉਪਲਬਧ ਨਹੀਂ | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | ਮਾਪਿਆ | NIST | |
| 576.14 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2s.2p.(3P*).3s 2P* → 2s.2p.(3P*).3p 2P | ਮਾਪਿਆ | NIST | |
| 585.63 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2s.2p.(3P*).3s 2P* → 2s.2p.(3P*).3p 2P | ਮਾਪਿਆ | NIST | |
| 593.55 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2s.2p.(3P*).3s 2P* → 2s.2p.(3P*).3p 2P | ਮਾਪਿਆ | NIST | |
| 604 nm | ਉਪਲਬਧ ਨਹੀਂ | F VII | emission | 1s2.8d 2D → 1s2.9p 2P* | ਮਾਪਿਆ | NIST | |
| 604 nm | ਉਪਲਬਧ ਨਹੀਂ | F VII | emission | 1s2.8d 2D → 1s2.9p 2P* | ਮਾਪਿਆ | NIST | |
| 604 nm | ਉਪਲਬਧ ਨਹੀਂ | F VII | emission | 1s2.8d 2D → 1s2.9p 2P* | ਮਾਪਿਆ | NIST | |
| 683 nm | ਉਪਲਬਧ ਨਹੀਂ | F VII | emission | 1s2.9p 2P* → 1s2.10d 2D | ਮਾਪਿਆ | NIST | |
| 683 nm | ਉਪਲਬਧ ਨਹੀਂ | F VII | emission | 1s2.9p 2P* → 1s2.10d 2D | ਮਾਪਿਆ | NIST | |
| 683 nm | ਉਪਲਬਧ ਨਹੀਂ | F VII | emission | 1s2.9p 2P* → 1s2.10d 2D | ਮਾਪਿਆ | NIST | |
| 713.8 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2s.2p.(3P*).4p 2D → 2s.2p.(3P*).4d 2F* | ਮਾਪਿਆ | NIST | |
| 719.4 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2s.2p.(3P*).4p 2D → 2s.2p.(3P*).4d 2F* | ਮਾਪਿਆ | NIST | |
| 723.4 nm | ਉਪਲਬਧ ਨਹੀਂ | F VI | emission | 1s2.2p.4s 1P* → 1s2.2p.4p 1D | ਮਾਪਿਆ | NIST | |
| 728.5 nm | ਉਪਲਬਧ ਨਹੀਂ | F VIII | emission | 1s.3s 1S → 1s.3p 1P* | ਮਾਪਿਆ | NIST | |
| 735.8 nm | ਉਪਲਬਧ ਨਹੀਂ | F V | emission | 2s.2p.(3P*).4p 2D → 2s.2p.(3P*).4d 2F* | ਮਾਪਿਆ | NIST |
ਵਿਸਤ੍ਰਿਤ ਗੁਣ
ਸਹਿ-ਸੰਯੋਜਕ ਅਰਧ-ਵਿਆਸ (ਵਿਸਤ੍ਰਿਤ)
- ਸਹਿ-ਸੰਯੋਜਕ ਅਰਧ-ਵਿਆਸ (ਪਿਊਕੋ)
- 64 pm
- ਸਹਿ-ਸੰਯੋਜਕ ਅਰਧ-ਵਿਆਸ (ਪਿਊਕੋ, ਦੋਹਰਾ ਬੰਧਨ)
- 59 pm
- ਸਹਿ-ਸੰਯੋਜਕ ਅਰਧ-ਵਿਆਸ (ਪਿਊਕੋ, ਤਿਹਰਾ ਬੰਧਨ)
- 53 pm
- ਸਹਿ-ਸੰਯੋਜਕ ਅਰਧ-ਵਿਆਸ (ਬ੍ਰੈਗ)
- 67 pm
ਵਾਨ ਡਰ ਵਾਲਜ਼ ਅਰਧ-ਵਿਆਸ
- Bondi
- 147 pm
- Batsanov
- 150 pm
- Alvarez
- 146 pm
- UFF
- 336.4 pm
- MM3
- 171 pm
- Dreiding
- 347.2 pm
- Rowland–Taylor
- 146 pm
ਪਰਮਾਣੂ ਅਤੇ ਧਾਤਵੀ ਅਰਧ-ਵਿਆਸ
- ਪਰਮਾਣੂ ਅਰਧ-ਵਿਆਸ (ਰਾਮ)
- 163 pm
ਅੰਕਨ ਪੈਮਾਨੇ
- Mendeleev
- 106
- Pettifor
- 102
- Glawe
- 102
ਬਿਜਲਈ ਰਿਣਾਤਮਕਤਾ ਦੇ ਪੈਮਾਨੇ
- Ghosh
- 0
- Gunnarsson–Lundqvist
- 11
- Robles–Bartolotti
- 10
ਧਰੁਵੀਕਰਨਯੋਗਤਾ ਅਤੇ ਪ੍ਰਕੀਰਣ
- ਦੋਧਰੁਵੀ ਧਰੁਵੀਕਰਨਯੋਗਤਾ
- 3.74 a.u.
- ਦੋਧਰੁਵੀ ਧਰੁਵੀਕਰਨਯੋਗਤਾ (ਅਨਿਸ਼ਚਿਤਤਾ)
- 0.08 a.u.
- C₆
- 9.52 Ha·Bohr6
- C₆ (Gould–Bučko)
- 10.2 Ha·Bohr6
ਰਸਾਇਣਕ ਬੰਧੁਤਾ
- ਪ੍ਰੋਟਾਨ ਬੰਧੁਤਾ
- 340.1 kJ/mol
- ਗੈਸੀ ਖਾਰਕਤਾ
- 315.1 kJ/mol
ਸਪਲਾਈ ਦਾ ਜੋਖਮ ਅਤੇ ਅਰਥਸ਼ਾਸਤਰ
- ਉਤਪਾਦਨ ਦੀ ਕੇਂਦਰਿਤਤਾ
- 56
- ਸਾਪੇਖ ਸਪਲਾਈ ਜੋਖਮ
- 7
- ਭੰਡਾਰਾਂ ਦੀ ਵੰਡ
- 17
- ਰਾਜਨੀਤਿਕ ਸਥਿਰਤਾ (ਸਭ ਤੋਂ ਵੱਡਾ ਉਤਪਾਦਕ)
- 24
- ਰਾਜਨੀਤਿਕ ਸਥਿਰਤਾ (ਸਭ ਤੋਂ ਵੱਧ ਭੰਡਾਰ ਵਾਲਾ ਦੇਸ਼)
- 44
ਅਵਸਥਾ ਪਰਿਵਰਤਨ ਅਤੇ ਅਪਰਰੂਪ
| ਪਿਘਲਣ ਦਰਜਾ | 53.48 K |
| ਉਬਾਲ ਦਰਜਾ | 85.04 K |
| ਕ੍ਰਾਂਤਿਕ ਬਿੰਦੂ (ਤਾਪਮਾਨ) | 144.41 K |
| ਕ੍ਰਾਂਤਿਕ ਬਿੰਦੂ (ਦਬਾਅ) | 5.17 MPa |
| ਤਿਹਰਾ ਬਿੰਦੂ (ਤਾਪਮਾਨ) | 53.48 K |
| ਤਿਹਰਾ ਬਿੰਦੂ (ਦਬਾਅ) | 90 kPa |
ਆਕਸੀਕਰਨ ਅਵਸਥਾ ਦੀਆਂ ਸ਼੍ਰੇਣੀਆਂ
ਉੱਨਤ ਸੰਦਰਭ ਡਾਟਾ
ਪਰਿਰੱਖਣ ਸਥਿਰਾਂਕ (3)
| n | ਔਰਬਿਟਲ | σ |
|---|---|---|
| 1 | s | 0.3499 |
| 2 | p | 3.9 |
| 2 | s | 3.8724 |
ਕ੍ਰਿਸਟਲ ਅਰਧ-ਵਿਆਸਾਂ ਦਾ ਵੇਰਵਾ (5)
| ਆਵੇਸ਼ | CN | ਸਪਿਨ | rcrystal (pm) | ਉਤਪੱਤੀ |
|---|---|---|---|---|
| -1 | II | 114.5 | ||
| -1 | III | 116 | ||
| -1 | IV | 117 | ||
| -1 | VI | 119 | ||
| 7 | VI | 22 | Ahrens (1952) ionic radius, |
ਸਮਸਥਾਨਿਕ ਖ਼ੈ ਦੀਆਂ ਵਿਧੀਆਂ (31)
| ਸਮਸਥਾਨਿਕ | ਮੋਡ | ਤੀਬਰਤਾ |
|---|---|---|
| 13 | p | — |
| 14 | p | — |
| 15 | p | 100% |
| 16 | p | 100% |
| 17 | B+ | 100% |
| 18 | B+ | 100% |
| 20 | B- | 100% |
| 21 | B- | 100% |
| 22 | B- | 100% |
| 22 | B-n | 11% |
ਐਕਸ-ਰੇ ਖਿੰਡਾਅ ਗੁਣਾਂਕ (502)
| ਊਰਜਾ (eV) | f₁ | f₂ |
|---|---|---|
| 10 | — | 0.05165 |
| 10.1617 | — | 0.05648 |
| 10.3261 | — | 0.06176 |
| 10.4931 | — | 0.06754 |
| 10.6628 | — | 0.07386 |
| 10.8353 | — | 0.08077 |
| 11.0106 | — | 0.08833 |
| 11.1886 | — | 0.09659 |
| 11.3696 | — | 0.10831 |
| 11.5535 | — | 0.12462 |
ਵਾਧੂ ਡਾਟਾ
Estimated Crustal Abundance
The estimated element abundance in the earth's crust.
5.85×102 milligrams per kilogram
ਸੰਦਰਭ (1)
- [5] Fluorine https://education.jlab.org/itselemental/ele009.html
Estimated Oceanic Abundance
The estimated element abundance in the earth's oceans.
1.3 milligrams per liter
ਸੰਦਰਭ (1)
- [5] Fluorine https://education.jlab.org/itselemental/ele009.html
ਸੰਦਰਭ
(9)
Data deposited in or computed by PubChem
The half-life and atomic mass data was provided by the Atomic Mass Data Center at the International Atomic Energy Agency.
Element data are cited from the Atomic weights of the elements (an IUPAC Technical Report). The IUPAC periodic table of elements can be found at https://iupac.org/what-we-do/periodic-table-of-elements/. Additional information can be found within IUPAC publication doi:10.1515/pac-2015-0703 Copyright © 2020 International Union of Pure and Applied Chemistry.
The information are cited from Pure Appl. Chem. 2018; 90(12): 1833-2092, https://doi.org/10.1515/pac-2015-0703.
Thomas Jefferson National Accelerator Facility (Jefferson Lab) is one of 17 national laboratories funded by the U.S. Department of Energy. The lab's primary mission is to conduct basic research of the atom's nucleus using the lab's unique particle accelerator, known as the Continuous Electron Beam Accelerator Facility (CEBAF). For more information visit https://www.jlab.org/
The periodic table at the LANL (Los Alamos National Laboratory) contains basic element information together with the history, source, properties, use, handling and more. The provenance data may be found from the link under the source name.
The periodic table contains NIST's critically-evaluated data on atomic properties of the elements. The provenance data that include data for atomic spectroscopy, X-ray and gamma ray, radiation dosimetry, nuclear physics, and condensed matter physics may be found from the link under the source name. Ref: https://www.nist.gov/pml/atomic-spectra-database
This section provides all form of data related to element Fluorine.
The element property data was retrieved from publications.