Fluorine (F)
halogenGas
Bobot Atom Standar
18,998403 uKonfigurasi elektron
[He] 2s2 2p5Titik lebur
-219,62 °CTitik didih
-188,12 °CMassa jenis
1,696 kg/m³Bilangan oksidasi
-1Keelektronegatifan (Pauling)
3,98Energi ionisasi (ke-1)
17,42282 eVTahun penemuan
1886Jari-jari atom
50 pmDetail
Fluorine is the lightest halogen and the most electronegative chemical element. In elemental form it occurs as diatomic fluorine, F₂, a highly reactive oxidizing gas. Natural fluorine is almost entirely the stable isotope ¹⁹F and is found in minerals rather than as the free element. Its chemistry underlies fluoride minerals, uranium enrichment chemistry, fluoropolymers, refrigerants, many agrochemicals, and a large share of modern medicinal chemistry.
Fluorine is the most electronegative and reactive of all elements. It is a pale yellow, corrosive gas, which reacts with most organic and inorganic substances. Finely divided metals, glass, ceramics, carbon, and even water burn in fluorine with a bright flame.
Until World War II, there was no commercial production of elemental fluorine. The nuclear bomb project and nuclear energy applications, however, made it necessary to produce large quantities.
The name derives from the Latin fluere for "flow" or "flux" because fluorite (CaF2) was used as a flux in metallurgy owing to its low melting point. It was discovered in hydrofluoric acid by the Swedish pharmacist and chemist Carl-Wilhelm Scheele in 1771, but it was not isolated until 1886 by the French pharmacist and chemist Henri Moissan.
Fluorine is the most reactive of all elements and no chemical substance is capable of freeing fluorine from any of its compounds. For this reason, fluorine does not occur free in nature and was extremely difficult for scientists to isolate. The first recorded use of a fluorine compound dates to around 1670 to a set of instructions for etching glass that called for Bohemian emerald (CaF2). Chemists attempted to identify the material that was capable of etching glass and George Gore was able to produce a small amount of fluorine through an electrolytic process in 1869. Unknown to Gore, fluorine gas explosively combines with hydrogen gas. That is exactly what happened in Gore's experiment when the fluorine gas that formed on one electrode combined with the hydrogen gas that formed on the other electrode. Ferdinand Frederic Henri Moissan, a French chemist, was the first to successfully isolate fluorine in 1886. He did this through the electrolysis of potassium fluoride (KF) and hydrofluoric acid (HF). He also completely isolated the fluorine gas from the hydrogen gas and he built his electrolysis device completely from platinum. His work was so impressive that he was awarded the Nobel Prize for chemistry in 1906. Today, fluorine is still produced through the electrolysis of potassium fluoride and hydrofluoric acid as well as through the electrolysis of molten potassium acid fluoride (KHF2).
From the Latin and French fluere: flow or flux. In 1529, Georigius Agricola described the use of fluorspar as a flux, and as early as 1670 Schwandhard found that glass was etched when exposed to fluorspar treated with acid. Scheele and many later investigators, including Davy, Gay-Lussac, Lavoisier, and Thenard, experimented with hydrofluoric acid, some experiments ending tragically.
The element was finally isolated in 1866 by Moissan after nearly 74 years of continuous effort.
Pure fluorine, F₂, is a pale yellow gas at ordinary temperature and pressure. It condenses to a yellow liquid and freezes to a pale solid at low temperature. The gas has a sharp, irritating odor, but odor is not a safe means of detection.
Elemental fluorine, F₂, is used mainly where its extreme oxidizing and fluorinating power is required, including preparation of uranium hexafluoride, UF₆, for isotope separation and manufacture of some specialty inorganic fluorides. Much larger practical importance lies in fluorine-containing compounds. Fluoropolymers such as polytetrafluoroethylene, (C₂F₄)ₙ, are used for chemically resistant coatings, seals, membranes, and electrical insulation. Fluoride compounds are used in glass etching, aluminum production, dental products, pharmaceuticals, and crop-protection chemicals.
Fluorine is added to city water supplies in the proportion of about one part per million to help prevent tooth decay. Sodium fluoride (NaF), stannous(II) fluoride (SnF2) and sodium monofluorophosphate (Na2PO3F) are all fluorine compounds added to toothpaste, also to help prevent tooth decay. Hydrofluoric acid (HF) is used to etch glass, including most of the glass used in light bulbs. Uranium hexafluoride (UF6) is used to separate isotopes of uranium. Crystals of calcium fluoride (CaF2), also known as fluorite and fluorspar, are used to make lenses to focus infrared light. Fluorine joins with carbon to form a class of compounds known as fluorocarbons. Some of these compounds, such as dichlorodifluoromethane (CF2Cl2), were widely used in air conditioning and refrigeration systems and in aerosol spray cans, but have been phased out due to the damage they were causing to the earth's ozone layer.
Fluorine and its compounds are used in producing uranium (from the hexafluoride) and more than 100 commercial fluorochemicals, including many high-temperature plastics. Hydrofluoric acid etches glass of light bulbs. Fluorochlorohydrocarbons are extensively used in air conditioning and refrigeration.
The presence of fluorine as a soluble fluoride in drinking water to the extent of 2 ppm may cause mottled enamel in teeth when used by children acquiring permanent teeth; in smaller amounts, however, fluoride helps prevent dental cavities.
Elemental fluorine has been studied as a rocket propellant as it has an exceptionally high specific impulse value.
Isotopes in Medicine
18F is a radioactive fluorine isotope that is used in an 18F-FDG compound (18F-labeled, fluoro-deoxy glucose) for imaging the organs, bones, tissues, and brain of the body with a technique called positron emission topography (PET). The 18F-FDG compound is injected and the isotopically labeled glucose is consumed by any cell requiring glucose as a source of energy [98] R. Krebs. The History And Use Of Our Earth’s Chemical Elements: A Reference Guide, 2nd ed. Greenwood Press, Westport, CT (2006)., [99] World Nuclear Association. Radioisotopes in Medicine, World Nuclear Association (2014), Feb. 23; http://www.world-nuclear.org/info/inf55.html..
– 18F emits positrons that collect in tissue and interact with regular negative electrons when injected into the body. The positrons and electrons annihilate each other, producing two gamma rays that are emitted in opposite directions. The radiation is detected on a PET camera, which generates a picture of the body part being examined (Fig. IUPAC.9.1).
–Because 18F has a short half-life of about 110 min, there is little chance of radiation damage to the patient.
Fluorine most commonly has oxidation state −1 in compounds, as in hydrogen fluoride, HF, sodium fluoride, NaF, and calcium fluoride, CaF₂. With highly electropositive elements it forms ionic fluorides; with nonmetals it forms strongly covalent fluorides such as sulfur hexafluoride, SF₆, and silicon tetrafluoride, SiF₄. Fluorine can also form interhalogen compounds, including chlorine trifluoride, ClF₃. Oxygen fluorides such as oxygen difluoride, OF₂, are unusual because fluorine is assigned the negative oxidation state while oxygen is positive.
One hypothesis says that fluorine can be substituted for hydrogen wherever it occurs in organic compounds, which could lead to an astronomical number of new fluorine compounds. Compounds of fluorine with rare gases have now been confirmed in fluorides of xenon, radon, and krypton.
See more information at the Fluorine compound page.
Elemental fluorine, F₂, is acutely toxic, corrosive, and a powerful oxidizer that can ignite or violently react with many materials. Hydrogen fluoride, HF, is especially hazardous because it penetrates tissue and binds calcium and magnesium ions. Soluble fluorides can be toxic at sufficient dose, while controlled low concentrations of fluoride ion, F⁻, have dental uses. Some fluorinated gases are chemically stable but may be asphyxiants or potent greenhouse gases.
Elemental fluorine and the fluoride ion are highly toxic. The free element has a characteristic pungent odor, detectable in concentrations as low as 20 ppb, which is below the safe working level. The recommended maximum allowable concentration for a daily 8-hour time-weighted exposure is 1 ppm.
Fluorine enters the environment chiefly as fluoride in minerals, volcanic emissions, sea spray, industrial releases, and weathering products. Fluoride ion, F⁻, binds to calcium, aluminum, and iron phases and can be immobilized in soils or sediments, though mobility depends strongly on pH and water chemistry. Elevated natural or industrial fluoride in groundwater can affect teeth, bones, livestock, and vegetation. Persistent organofluorine compounds vary widely in mobility and degradation behavior.
Fluorine supply is based primarily on mining fluorite, CaF₂, with smaller contributions from fluorapatite-bearing phosphate rock processed in fertilizer production. Hydrogen fluoride, HF, is the central industrial intermediate, made by treating fluorite with sulfuric acid, H₂SO₄. Direct production and transport of elemental fluorine are limited by its reactivity, so it is commonly generated or consumed close to the point of use. Demand is tied to aluminum smelting, chemical manufacturing, electronics materials, fluoropolymers, and regulated refrigerant transitions. Recycling is important for some fluorinated materials but is often chemically or economically difficult.
Found in the minerals fluorite (CaF2) and cryolite(Na3AlF6). Electrolysis of hydrofluoric acid (HF) or potassium acid fluoride (KHF2) is the only practical method of commercial production.
Fluorine is relatively rare in the cosmos compared with neighboring light elements. It is thought to be made in several settings, including helium-burning regions of evolved stars, neutrino-driven processes in core-collapse supernovae, and possibly novae, with their relative contributions still studied. In planetary materials it is concentrated into minerals, melts, and volatile-bearing phases rather than remaining as free F₂.
- Fluorine has only one stable natural isotope, ¹⁹F.
- Fluorite, CaF₂, gave the element its name through its use as a flux.
- Glass etching by hydrogen fluoride, HF, reflects the strength of silicon-fluorine bonding.
- Polytetrafluoroethylene, (C₂F₄)ₙ, was discovered accidentally during refrigerant research.
- Uranium hexafluoride, UF₆, is volatile enough for gas-phase isotope enrichment.
- Fluoride minerals can preserve fluorine in rocks over geologic time.
Gambar
Sifat
Fisika
- Jari-jari atom (empiris)
- 50 pm Bandingkan Jari-jari atom (empiris) semua unsur →
- Jari-jari kovalen
- 57 pm Bandingkan Jari-jari kovalen semua unsur →
- Jari-jari van der Waals
- 135 pm Bandingkan Jari-jari van der Waals semua unsur →
- Massa jenis
- 1,696 kg/m³ Bandingkan Massa jenis semua unsur →
- Volume molar
- 0,0171 L/mol
- Fase pada STP
- Gas Bandingkan Fase pada STP semua unsur →
- Titik lebur
- -219,62 °C Bandingkan Titik lebur semua unsur →
- Titik didih
- -188,12 °C Bandingkan Titik didih semua unsur →
- Konduktivitas termal
- 0,028 W/(m·K) Bandingkan Konduktivitas termal semua unsur →
- Kapasitas kalor spesifik
- 0,824 J/(g·K) Bandingkan Kapasitas kalor spesifik semua unsur →
- Kapasitas kalor molar
- 31,304 J/(mol·K) Bandingkan Kapasitas kalor molar semua unsur →
- Struktur kristal
- Monoklinik Bandingkan Struktur kristal semua unsur →
Kimia
- Keelektronegatifan (Pauling)
- 3,98 Bandingkan Keelektronegatifan (Pauling) semua unsur →
- Keelektronegatifan (Allen)
- 4,193
- Afinitas elektron
- 3,4011 eV
- Energi ionisasi (ke-1)
- 17,42282 eV Bandingkan Energi ionisasi (ke-1) semua unsur →
- Energi ionisasi (ke-2)
- 34,97093 eV Bandingkan Energi ionisasi (ke-2) semua unsur →
- Energi ionisasi (ke-3)
- 62,708196 eV Bandingkan Energi ionisasi (ke-3) semua unsur →
- Energi ionisasi (ke-4)
- 87,1753 eV Bandingkan Energi ionisasi (ke-4) semua unsur →
- Energi ionisasi (ke-5)
- 114,249393 eV Bandingkan Energi ionisasi (ke-5) semua unsur →
- Bilangan oksidasi
- -1 Bandingkan Bilangan oksidasi semua unsur →
- Elektron valensi
- 7 Bandingkan Elektron valensi semua unsur →
- Konfigurasi elektron
- [He] 2s2 2p5
Termodinamika
- Titik tripel (suhu)
- -219,67 °C
- Titik tripel (tekanan)
- 9e+4 Pa
- Titik kritis (suhu)
- -128,74 °C
- Titik kritis (tekanan)
- 5,1724e+6 Pa
- Kalor peleburan
- 0,0026429 eV Bandingkan Kalor peleburan semua unsur →
- Kalor penguapan
- 0,06778256 eV Bandingkan Kalor penguapan semua unsur →
- Kalor atomisasi
- 0,8228222 eV
- Entalpi atomisasi
- 0,82225216 eV
Nuklir
- Proton
- 9 Bandingkan Proton semua unsur →
- Neutron
- 10 Bandingkan Neutron semua unsur →
- Isotop yang diketahui
- 19 Bandingkan Isotop yang diketahui semua unsur →
- Isotop stabil
- 1 Bandingkan Isotop stabil semua unsur →
- Isotop paling stabil
- F-19
- Tahun penemuan
- 1886
Kelimpahan
- Kelimpahan (kerak Bumi)
- 585 mg/kg Bandingkan Kelimpahan (kerak Bumi) semua unsur →
- Kelimpahan (samudra)
- 1,3 mg/L Bandingkan Kelimpahan (samudra) semua unsur →
Struktur Kristal
Tidak tersedia
Struktur Elektronik
- Elektron per kulit
- 2, 7 Bandingkan Elektron per kulit semua unsur →
Pengenal
- Nomor CAS
- 7782-41-4 Bandingkan Nomor CAS semua unsur →
- Simbol term
- 2P°3/2
- InChI
- InChI=1S/F
- Kunci InChI
- YCKRFDGAMUMZLT-UHFFFAOYSA-N
Konfigurasi Elektron Diukur
F: 2s² 2p⁵[He] 2s² 2p⁵1s² 2s² 2p⁵Model atom
Isotop mengubah jumlah neutron, massa, dan kestabilan — bukan konfigurasi elektron atom netral.
Model atom skematis, tidak sesuai skala.
Sidik Jari Atom
Spektrum Emisi / Absorpsi
Distribusi Isotop
| Nomor massa | Massa atom (u) | Kelimpahan alami | Waktu paruh |
|---|---|---|---|
| 19 Stabil | 18,99840316273 ± 0,00000000092 | 100,0000% | Stabil |
Fase / Wujud
Alasan: 213,1 °C di atas titik didih (-188,12 °C)
Skematis, tidak sesuai skala
Titik transisi fase
Energi transisi
Energi yang diperlukan untuk meleburkan 1 mol pada titik lebur
Energi yang diperlukan untuk menguapkan 1 mol pada titik didih
Massa jenis
Pada kondisi standar
Diperkirakan menggunakan hukum gas ideal pada T saat ini
Lanjutan
Spektrum Atom
Data Garis Spektrum ?
| Ion | Muatan | Total garis | Probabilitas transisi | Penamaan tingkat energi |
|---|---|---|---|---|
| F I | 0 | 162 | 120 | 162 |
| F II | +1 | 150 | 67 | 67 |
| F III | +2 | 141 | 34 | 34 |
| F IV | +3 | 75 | 30 | 30 |
| F V | +4 | 513 | 472 | 472 |
| F VI | +5 | 269 | 269 | 269 |
| F VII | +6 | 470 | 439 | 470 |
| F VIII | +7 | 128 | 128 | 128 |
| F IX | +8 | 137 | 137 | 137 |
Data Tingkat Energi ?
| Ion | Muatan | Tingkat energi |
|---|---|---|
| F I | 0 | 303 |
| F II | +1 | 291 |
| F III | +2 | 278 |
| F IV | +3 | 170 |
| F V | +4 | 138 |
| F VI | +5 | 100 |
| F VII | +6 | 77 |
| F VIII | +7 | 151 |
| F IX | +8 | 149 |
Jari-jari Ion
| Muatan | Koordinasi | Spin | Jari-jari |
|---|---|---|---|
| -1 | 2 | Tidak tersedia | 128.5 pm |
| -1 | 3 | Tidak tersedia | 130 pm |
| -1 | 4 | Tidak tersedia | 131 pm |
| -1 | 6 | Tidak tersedia | 133 pm |
| +7 | 6 | Tidak tersedia | 8 pm |
Senyawa
Isotop (1)
| Nomor massa | Massa atom (u) | Kelimpahan alami | Waktu paruh | Mode peluruhan | |
|---|---|---|---|---|---|
| 19 Stabil | 18,99840316273 ± 0,00000000092 | 100,0000% | Stabil | stable |
Garis Spektrum
| Panjang gelombang (nm) | Intensitas | Tahap ionisasi | Jenis | Transisi | Akurasi | Sumber | |
|---|---|---|---|---|---|---|---|
| 383.22 nm | Tidak tersedia | F V | emission | 2s.2p.(3P*).4d 2F* → 2p2.(1D).3d 2D | Diukur | NIST | |
| 384.7086 nm | 270 | F II | emission | 2s2.2p3.(4S*).3s 5S* → 2s2.2p3.(4S*).3p 5P | Diukur | NIST | |
| 384.9985 nm | 260 | F II | emission | 2s2.2p3.(4S*).3s 5S* → 2s2.2p3.(4S*).3p 5P | Diukur | NIST | |
| 385.1668 nm | 250 | F II | emission | 2s2.2p3.(4S*).3s 5S* → 2s2.2p3.(4S*).3p 5P | Diukur | NIST | |
| 385.69 nm | Tidak tersedia | F VI | emission | 1s2.2s.3s 1S → 1s2.2s.3p 3P* | Diukur | NIST | |
| 385.712 nm | Tidak tersedia | F V | emission | 2p2.(3P).3p 4S* → 2p2.(3P).3d 4P | Diukur | NIST | |
| 387.086 nm | Tidak tersedia | F V | emission | 2p2.(3P).3p 4S* → 2p2.(3P).3d 4P | Diukur | NIST | |
| 388.508 nm | Tidak tersedia | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | Diukur | NIST | |
| 388.6 nm | Tidak tersedia | F VII | emission | 1s2.7f 2F* → 1s2.8g 2G | Diukur | NIST | |
| 388.6 nm | Tidak tersedia | F VII | emission | 1s2.7f 2F* → 1s2.8g 2G | Diukur | NIST | |
| 388.6 nm | Tidak tersedia | F VII | emission | 1s2.7f 2F* → 1s2.8g 2G | Diukur | NIST | |
| 389.2 nm | Tidak tersedia | F VII | emission | 1s2.7f 2F* → 1s2.8d 2D | Diukur | NIST | |
| 389.2 nm | Tidak tersedia | F VII | emission | 1s2.7f 2F* → 1s2.8d 2D | Diukur | NIST | |
| 389.2 nm | Tidak tersedia | F VII | emission | 1s2.7f 2F* → 1s2.8d 2D | Diukur | NIST | |
| 390.229 nm | Tidak tersedia | F V | emission | 2p2.(3P).3p 4S* → 2p2.(3P).3d 4P | Diukur | NIST | |
| 390.45 nm | Tidak tersedia | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | Diukur | NIST | |
| 394.51 nm | Tidak tersedia | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2F | Diukur | NIST | |
| 394.51 nm | Tidak tersedia | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2F | Diukur | NIST | |
| 394.51 nm | Tidak tersedia | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2F | Diukur | NIST | |
| 394.518 nm | Tidak tersedia | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | Diukur | NIST | |
| 394.736 nm | Tidak tersedia | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | Diukur | NIST | |
| 396.08 nm | Tidak tersedia | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | Diukur | NIST | |
| 396.113 nm | Tidak tersedia | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | Diukur | NIST | |
| 399.6 nm | Tidak tersedia | F VII | emission | 1s2.7d 2D → 1s2.8p 2P* | Diukur | NIST | |
| 399.6 nm | Tidak tersedia | F VII | emission | 1s2.7d 2D → 1s2.8p 2P* | Diukur | NIST | |
| 399.6 nm | Tidak tersedia | F VII | emission | 1s2.7d 2D → 1s2.8p 2P* | Diukur | NIST | |
| 399.692 nm | Tidak tersedia | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | Diukur | NIST | |
| 399.692 nm | Tidak tersedia | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | Diukur | NIST | |
| 400.26 nm | Tidak tersedia | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | Diukur | NIST | |
| 400.942 nm | Tidak tersedia | F V | emission | 2p2.(3P).3s 4P → 2s.2p.(3P*).4s 4P* | Diukur | NIST | |
| 402.4726 nm | 240 | F II | emission | 2s2.2p3.(4S*).3s 3S* → 2s2.2p3.(4S*).3p 3P | Diukur | NIST | |
| 402.501 nm | 220 | F II | emission | 2s2.2p3.(4S*).3s 3S* → 2s2.2p3.(4S*).3p 3P | Diukur | NIST | |
| 402.5491 nm | 230 | F II | emission | 2s2.2p3.(4S*).3s 3S* → 2s2.2p3.(4S*).3p 3P | Diukur | NIST | |
| 405.99 nm | Tidak tersedia | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | Diukur | NIST | |
| 405.99 nm | Tidak tersedia | F IV | emission | 2s2.2p2 3P → 2s2.2p2 1D | Diukur | NIST | |
| 410.3075 nm | 190 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | Diukur | NIST | |
| 410.3213 nm | 170 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | Diukur | NIST | |
| 410.3506 nm | 200 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | Diukur | NIST | |
| 410.3713 nm | 180 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | Diukur | NIST | |
| 410.387 nm | 170 | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | Diukur | NIST | |
| 410.4008 nm | Tidak tersedia | F II | emission | 2s2.2p3.(4S*).3p 3P → 2s2.2p3.(4S*).3d 3D* | Diukur | NIST | |
| 410.916 nm | 170 | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | Diukur | NIST | |
| 411.03 nm | Tidak tersedia | F VI | emission | 1s2.2s.3p 1P* → 1s2.2s.3d 3D | Diukur | NIST | |
| 411.272 nm | Tidak tersedia | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | Diukur | NIST | |
| 411.2969 nm | Tidak tersedia | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | Diukur | NIST | |
| 411.44 nm | Tidak tersedia | F VI | emission | 1s2.2s.3p 1P* → 1s2.2s.3d 3D | Diukur | NIST | |
| 411.6535 nm | 160 | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | Diukur | NIST | |
| 411.699 nm | Tidak tersedia | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | Diukur | NIST | |
| 411.8752 nm | Tidak tersedia | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | Diukur | NIST | |
| 411.9207 nm | 150 | F II | emission | 2s2.2p3.(2D*).3s 3D* → 2s2.2p3.(2D*).3p 3D | Diukur | NIST | |
| 415.775 nm | Tidak tersedia | F II | emission | 2s2.2p4 1D → 2s2.2p4 1S | Diukur | NIST | |
| 423.3 nm | Tidak tersedia | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | Diukur | NIST | |
| 424.76 nm | Tidak tersedia | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | Diukur | NIST | |
| 426.19 nm | Tidak tersedia | F V | emission | 2s.2p.(3P*).3p 2D → 2s.2p.(3P*).3d 2D* | Diukur | NIST | |
| 426.28 nm | Tidak tersedia | F VI | emission | 1s2.2s.3s 1S → 1s2.2s.3p 1P* | Diukur | NIST | |
| 427.32 nm | Tidak tersedia | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | Diukur | NIST | |
| 427.94 nm | Tidak tersedia | F V | emission | 2s.2p.(3P*).3p 2D → 2s.2p.(3P*).3d 2D* | Diukur | NIST | |
| 429.9165 nm | 200 | F II | emission | 2s2.2p3.(2D*).3s 1D* → 2s2.2p3.(2D*).3p 1F | Diukur | NIST | |
| 432.27 nm | Tidak tersedia | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | Diukur | NIST | |
| 433.94 nm | Tidak tersedia | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | Diukur | NIST | |
| 435.28 nm | Tidak tersedia | F V | emission | 2s.2p.(3P*).3p 2D → 2s.2p.(3P*).3d 2D* | Diukur | NIST | |
| 437.11 nm | Tidak tersedia | F V | emission | 2s.2p.(3P*).3p 2D → 2s.2p.(3P*).3d 2D* | Diukur | NIST | |
| 439.05 nm | Tidak tersedia | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3P* | Diukur | NIST | |
| 444.6527 nm | 160 | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | Diukur | NIST | |
| 444.6689 nm | Tidak tersedia | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | Diukur | NIST | |
| 444.6721 nm | 170 | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | Diukur | NIST | |
| 444.7117 nm | Tidak tersedia | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | Diukur | NIST | |
| 444.7148 nm | Tidak tersedia | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | Diukur | NIST | |
| 444.7188 nm | 180 | F II | emission | 2s2.2p3.(4S*).3d 3D* → 2s2.2p3.(4S*).4f 3F | Diukur | NIST | |
| 455.99 nm | Tidak tersedia | F VI | emission | 1s2.2p.3p 1D → 1s2.2p.3d 1F* | Diukur | NIST | |
| 456.45 nm | Tidak tersedia | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | Diukur | NIST | |
| 457.45 nm | Tidak tersedia | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | Diukur | NIST | |
| 457.96 nm | Tidak tersedia | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | Diukur | NIST | |
| 459.81 nm | Tidak tersedia | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | Diukur | NIST | |
| 460.57 nm | Tidak tersedia | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | Diukur | NIST | |
| 461.08 nm | Tidak tersedia | F VI | emission | 1s2.2s.3p 3P* → 1s2.2s.3d 3D | Diukur | NIST | |
| 463.41 nm | Tidak tersedia | F VI | emission | 1s2.2p.4p 1P → 1s2.2p.4d 1P* | Diukur | NIST | |
| 478.945 nm | Tidak tersedia | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | Diukur | NIST | |
| 478.945 nm | Tidak tersedia | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | Diukur | NIST | |
| 486.899 nm | Tidak tersedia | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | Diukur | NIST | |
| 486.899 nm | Tidak tersedia | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | Diukur | NIST | |
| 490.456 nm | Tidak tersedia | F II | emission | 2s2.2p4 3P → 2s2.2p4 1D | Diukur | NIST | |
| 507.4 nm | Tidak tersedia | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | Diukur | NIST | |
| 507.86 nm | Tidak tersedia | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | Diukur | NIST | |
| 509.78 nm | Tidak tersedia | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | Diukur | NIST | |
| 510.25 nm | Tidak tersedia | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | Diukur | NIST | |
| 511.78 nm | Tidak tersedia | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | Diukur | NIST | |
| 515.72 nm | Tidak tersedia | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | Diukur | NIST | |
| 517.29 nm | Tidak tersedia | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | Diukur | NIST | |
| 517.4 nm | Tidak tersedia | F VIII | emission | 1s.3s 3S → 1s.3p 3P* | Diukur | NIST | |
| 522.95 nm | Tidak tersedia | F V | emission | 2s.2p.(3P*).4d 4D* → 2p2.(3P).3d 4P | Diukur | NIST | |
| 525.1 nm | Tidak tersedia | F VIII | emission | 1s.3s 3S → 1s.3p 3P* | Diukur | NIST | |
| 528.03 nm | Tidak tersedia | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2D | Diukur | NIST | |
| 528.03 nm | Tidak tersedia | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2D | Diukur | NIST | |
| 528.03 nm | Tidak tersedia | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2D | Diukur | NIST | |
| 528.03 nm | Tidak tersedia | F V | emission | 2p2.(1D).3p 2D* → 2p2.(1D).3d 2D | Diukur | NIST | |
| 533.07 nm | Tidak tersedia | F VI | emission | 1s2.2p.3p 1S → 1s2.2p.3d 1P* | Diukur | NIST | |
| 543.21 nm | Tidak tersedia | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | Diukur | NIST | |
| 544 nm | Tidak tersedia | F VII | emission | 1s2.8p 2P* → 1s2.9d 2D | Diukur | NIST | |
| 544 nm | Tidak tersedia | F VII | emission | 1s2.8p 2P* → 1s2.9d 2D | Diukur | NIST | |
| 544 nm | Tidak tersedia | F VII | emission | 1s2.8p 2P* → 1s2.9d 2D | Diukur | NIST | |
| 545.91 nm | Tidak tersedia | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | Diukur | NIST | |
| 549.84 nm | Tidak tersedia | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | Diukur | NIST | |
| 549.99 nm | Tidak tersedia | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | Diukur | NIST | |
| 556.76 nm | Tidak tersedia | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | Diukur | NIST | |
| 560.85 nm | Tidak tersedia | F VI | emission | 1s2.2p.3p 3P → 1s2.2p.3d 3D* | Diukur | NIST | |
| 568.67 nm | Tidak tersedia | F V | emission | 2s.2p.(3P*).3s 2P* → 2s.2p.(3P*).3p 2P | Diukur | NIST | |
| 572.12 nm | Tidak tersedia | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | Diukur | NIST | |
| 572.12 nm | Tidak tersedia | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | Diukur | NIST | |
| 572.15 nm | Tidak tersedia | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | Diukur | NIST | |
| 573.29 nm | Tidak tersedia | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | Diukur | NIST | |
| 573.29 nm | Tidak tersedia | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | Diukur | NIST | |
| 573.32 nm | Tidak tersedia | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | Diukur | NIST | |
| 573.32 nm | Tidak tersedia | F III | emission | 2s2.2p3 2D* → 2s2.2p3 2P* | Diukur | NIST | |
| 576.14 nm | Tidak tersedia | F V | emission | 2s.2p.(3P*).3s 2P* → 2s.2p.(3P*).3p 2P | Diukur | NIST | |
| 585.63 nm | Tidak tersedia | F V | emission | 2s.2p.(3P*).3s 2P* → 2s.2p.(3P*).3p 2P | Diukur | NIST | |
| 593.55 nm | Tidak tersedia | F V | emission | 2s.2p.(3P*).3s 2P* → 2s.2p.(3P*).3p 2P | Diukur | NIST | |
| 604 nm | Tidak tersedia | F VII | emission | 1s2.8d 2D → 1s2.9p 2P* | Diukur | NIST | |
| 604 nm | Tidak tersedia | F VII | emission | 1s2.8d 2D → 1s2.9p 2P* | Diukur | NIST | |
| 604 nm | Tidak tersedia | F VII | emission | 1s2.8d 2D → 1s2.9p 2P* | Diukur | NIST | |
| 683 nm | Tidak tersedia | F VII | emission | 1s2.9p 2P* → 1s2.10d 2D | Diukur | NIST | |
| 683 nm | Tidak tersedia | F VII | emission | 1s2.9p 2P* → 1s2.10d 2D | Diukur | NIST | |
| 683 nm | Tidak tersedia | F VII | emission | 1s2.9p 2P* → 1s2.10d 2D | Diukur | NIST | |
| 713.8 nm | Tidak tersedia | F V | emission | 2s.2p.(3P*).4p 2D → 2s.2p.(3P*).4d 2F* | Diukur | NIST | |
| 719.4 nm | Tidak tersedia | F V | emission | 2s.2p.(3P*).4p 2D → 2s.2p.(3P*).4d 2F* | Diukur | NIST | |
| 723.4 nm | Tidak tersedia | F VI | emission | 1s2.2p.4s 1P* → 1s2.2p.4p 1D | Diukur | NIST | |
| 728.5 nm | Tidak tersedia | F VIII | emission | 1s.3s 1S → 1s.3p 1P* | Diukur | NIST | |
| 735.8 nm | Tidak tersedia | F V | emission | 2s.2p.(3P*).4p 2D → 2s.2p.(3P*).4d 2F* | Diukur | NIST |
Sifat Lanjutan
Jari-jari Kovalen (Lanjutan)
- Jari-jari kovalen (Pyykkö)
- 64 pm
- Jari-jari kovalen (Pyykkö, ikatan rangkap dua)
- 59 pm
- Jari-jari kovalen (Pyykkö, ikatan rangkap tiga)
- 53 pm
- Jari-jari kovalen (Bragg)
- 67 pm
Jari-jari van der Waals
- Bondi
- 147 pm
- Batsanov
- 150 pm
- Alvarez
- 146 pm
- UFF
- 336,4 pm
- MM3
- 171 pm
- Dreiding
- 347,2 pm
- Rowland–Taylor
- 146 pm
Jari-jari Atom & Logam
- Jari-jari atom (Rahm)
- 163 pm
Skala Penomoran
- Mendeleev
- 106
- Pettifor
- 102
- Glawe
- 102
Skala Keelektronegatifan
- Ghosh
- 0
- Gunnarsson–Lundqvist
- 11
- Robles–Bartolotti
- 10
Polarizabilitas & Dispersi
- Polarizabilitas dipol
- 3,74 a.u.
- Polarizabilitas dipol (ketidakpastian)
- 0,08 a.u.
- C₆
- 9,52 Ha·Bohr6
- C₆ (Gould–Bučko)
- 10,2 Ha·Bohr6
Afinitas Kimia
- Afinitas proton
- 340,1 kJ/mol
- Kebasaan fase gas
- 315,1 kJ/mol
Risiko Pasokan & Ekonomi
- Konsentrasi produksi
- 56
- Risiko pasokan relatif
- 7
- Distribusi cadangan
- 17
- Stabilitas politik (produsen terbesar)
- 24
- Stabilitas politik (pemilik cadangan terbesar)
- 44
Transisi Fase & Alotrop
| Titik lebur | 53,48 K |
| Titik didih | 85,04 K |
| Titik kritis (suhu) | 144,41 K |
| Titik kritis (tekanan) | 5,17 MPa |
| Titik tripel (suhu) | 53,48 K |
| Titik tripel (tekanan) | 90 kPa |
Kategori Bilangan Oksidasi
Data Referensi Lanjutan
Konstanta Pemerisaian (3)
| n | Orbital | σ |
|---|---|---|
| 1 | s | 0,3499 |
| 2 | p | 3,9 |
| 2 | s | 3,8724 |
Detail Jari-jari Kristal (5)
| Muatan | CN | Spin | rcrystal (pm) | Asal |
|---|---|---|---|---|
| -1 | II | 114,5 | ||
| -1 | III | 116 | ||
| -1 | IV | 117 | ||
| -1 | VI | 119 | ||
| 7 | VI | 22 | Ahrens (1952) ionic radius, |
Mode Peluruhan Isotop (31)
| Isotop | Mode | Intensitas |
|---|---|---|
| 13 | p | — |
| 14 | p | — |
| 15 | p | 100% |
| 16 | p | 100% |
| 17 | B+ | 100% |
| 18 | B+ | 100% |
| 20 | B- | 100% |
| 21 | B- | 100% |
| 22 | B- | 100% |
| 22 | B-n | 11% |
Faktor Hamburan Sinar-X (502)
| Energi (eV) | f₁ | f₂ |
|---|---|---|
| 10 | — | 0,05165 |
| 10,1617 | — | 0,05648 |
| 10,3261 | — | 0,06176 |
| 10,4931 | — | 0,06754 |
| 10,6628 | — | 0,07386 |
| 10,8353 | — | 0,08077 |
| 11,0106 | — | 0,08833 |
| 11,1886 | — | 0,09659 |
| 11,3696 | — | 0,10831 |
| 11,5535 | — | 0,12462 |
Data Tambahan
Estimated Crustal Abundance
The estimated element abundance in the earth's crust.
5.85×102 milligrams per kilogram
Referensi (1)
- [5] Fluorine https://education.jlab.org/itselemental/ele009.html
Estimated Oceanic Abundance
The estimated element abundance in the earth's oceans.
1.3 milligrams per liter
Referensi (1)
- [5] Fluorine https://education.jlab.org/itselemental/ele009.html
Referensi
(9)
Data deposited in or computed by PubChem
The half-life and atomic mass data was provided by the Atomic Mass Data Center at the International Atomic Energy Agency.
Element data are cited from the Atomic weights of the elements (an IUPAC Technical Report). The IUPAC periodic table of elements can be found at https://iupac.org/what-we-do/periodic-table-of-elements/. Additional information can be found within IUPAC publication doi:10.1515/pac-2015-0703 Copyright © 2020 International Union of Pure and Applied Chemistry.
The information are cited from Pure Appl. Chem. 2018; 90(12): 1833-2092, https://doi.org/10.1515/pac-2015-0703.
Thomas Jefferson National Accelerator Facility (Jefferson Lab) is one of 17 national laboratories funded by the U.S. Department of Energy. The lab's primary mission is to conduct basic research of the atom's nucleus using the lab's unique particle accelerator, known as the Continuous Electron Beam Accelerator Facility (CEBAF). For more information visit https://www.jlab.org/
The periodic table at the LANL (Los Alamos National Laboratory) contains basic element information together with the history, source, properties, use, handling and more. The provenance data may be found from the link under the source name.
The periodic table contains NIST's critically-evaluated data on atomic properties of the elements. The provenance data that include data for atomic spectroscopy, X-ray and gamma ray, radiation dosimetry, nuclear physics, and condensed matter physics may be found from the link under the source name. Ref: https://www.nist.gov/pml/atomic-spectra-database
This section provides all form of data related to element Fluorine.
The element property data was retrieved from publications.